JPS5535373A - Photosensitive resin composition for screen process - Google Patents
Photosensitive resin composition for screen processInfo
- Publication number
- JPS5535373A JPS5535373A JP10875078A JP10875078A JPS5535373A JP S5535373 A JPS5535373 A JP S5535373A JP 10875078 A JP10875078 A JP 10875078A JP 10875078 A JP10875078 A JP 10875078A JP S5535373 A JPS5535373 A JP S5535373A
- Authority
- JP
- Japan
- Prior art keywords
- high molecular
- molecular latex
- water
- resin composition
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PURPOSE: To enhance the screen coating properties, physical and chemical properties (e.g. water resistance), by using high molecular latex.
CONSTITUTION: A photosensitive resin composition for screen process is formed by dispersing and dissolving photosensitizing agent and, if necessary, crosslinkable oligomer into an alkaline water-soluble high molecular latex obtained by reacting unsaturated epoxy monomer with water disperse high molecular latex solution possessing acid radical and amideradical. the water disperse high molecular latex possessing acid radical and amide radical is prepared by various known emulsion polymerization methods, using, e.g., unsaturated amide monomer, unsaturated acid monomer, and, if necessary, one or more than one kind of vinyl monomers which are copolymerizable therewith.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10875078A JPS5535373A (en) | 1978-09-04 | 1978-09-04 | Photosensitive resin composition for screen process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10875078A JPS5535373A (en) | 1978-09-04 | 1978-09-04 | Photosensitive resin composition for screen process |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5535373A true JPS5535373A (en) | 1980-03-12 |
Family
ID=14492549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10875078A Pending JPS5535373A (en) | 1978-09-04 | 1978-09-04 | Photosensitive resin composition for screen process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5535373A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59147346A (en) * | 1983-02-10 | 1984-08-23 | Nippon Soda Co Ltd | Acid-developable polybutadiene type photosensitive resin |
JPS6264814A (en) * | 1985-09-17 | 1987-03-23 | Japan Synthetic Rubber Co Ltd | Production of copolymer |
WO2002033013A1 (en) * | 2000-10-14 | 2002-04-25 | Avecia B.V. | Polymeric aqueous coating compositions |
WO2002033012A3 (en) * | 2000-10-14 | 2003-03-13 | Avecia Bv | Aqueous vinyl polymer coating compositions |
-
1978
- 1978-09-04 JP JP10875078A patent/JPS5535373A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59147346A (en) * | 1983-02-10 | 1984-08-23 | Nippon Soda Co Ltd | Acid-developable polybutadiene type photosensitive resin |
JPS6264814A (en) * | 1985-09-17 | 1987-03-23 | Japan Synthetic Rubber Co Ltd | Production of copolymer |
WO2002033013A1 (en) * | 2000-10-14 | 2002-04-25 | Avecia B.V. | Polymeric aqueous coating compositions |
WO2002033012A3 (en) * | 2000-10-14 | 2003-03-13 | Avecia Bv | Aqueous vinyl polymer coating compositions |
US7223813B2 (en) | 2000-10-14 | 2007-05-29 | Dsm Ip Assets B.V. | Aqueous vinyl polymer coating compositions |
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