JPS5534929B2 - - Google Patents

Info

Publication number
JPS5534929B2
JPS5534929B2 JP2394074A JP2394074A JPS5534929B2 JP S5534929 B2 JPS5534929 B2 JP S5534929B2 JP 2394074 A JP2394074 A JP 2394074A JP 2394074 A JP2394074 A JP 2394074A JP S5534929 B2 JPS5534929 B2 JP S5534929B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2394074A
Other languages
Japanese (ja)
Other versions
JPS50118802A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2394074A priority Critical patent/JPS5534929B2/ja
Priority to GB813175A priority patent/GB1505739A/en
Priority to CA221,185A priority patent/CA1060252A/en
Priority to DE19752508618 priority patent/DE2508618C2/en
Priority to FR7506415A priority patent/FR2262813B1/fr
Publication of JPS50118802A publication Critical patent/JPS50118802A/ja
Priority to US05/760,371 priority patent/US4123276A/en
Publication of JPS5534929B2 publication Critical patent/JPS5534929B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2394074A 1974-02-28 1974-02-28 Expired JPS5534929B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2394074A JPS5534929B2 (en) 1974-02-28 1974-02-28
GB813175A GB1505739A (en) 1974-02-28 1975-02-26 Photosensitive composition
CA221,185A CA1060252A (en) 1974-02-28 1975-02-27 Photosensitive composition containing diazo compound and copolymer
DE19752508618 DE2508618C2 (en) 1974-02-28 1975-02-27 Photosensitive mixture
FR7506415A FR2262813B1 (en) 1974-02-28 1975-02-28
US05/760,371 US4123276A (en) 1974-02-28 1977-01-18 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2394074A JPS5534929B2 (en) 1974-02-28 1974-02-28

Publications (2)

Publication Number Publication Date
JPS50118802A JPS50118802A (en) 1975-09-17
JPS5534929B2 true JPS5534929B2 (en) 1980-09-10

Family

ID=12124516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2394074A Expired JPS5534929B2 (en) 1974-02-28 1974-02-28

Country Status (5)

Country Link
JP (1) JPS5534929B2 (en)
CA (1) CA1060252A (en)
DE (1) DE2508618C2 (en)
FR (1) FR2262813B1 (en)
GB (1) GB1505739A (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS5498613A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5552054A (en) * 1978-10-11 1980-04-16 Konishiroku Photo Ind Co Ltd Developing solution composition
JPS564144A (en) * 1979-06-23 1981-01-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
CA1153611A (en) * 1980-04-30 1983-09-13 Minnesota Mining And Manufacturing Company Aqueous developable photosensitive composition and printing plate
JPS5964396A (en) * 1982-10-05 1984-04-12 Fuji Photo Film Co Ltd Plate surface protecting agent for planographic printing plate
JPS60217356A (en) * 1984-04-13 1985-10-30 Asahi Chem Ind Co Ltd Photosensitive composition
JP2550346B2 (en) * 1987-05-18 1996-11-06 光陽化学工業株式会社 Photosensitive composition for lithographic printing plate making
FR2651337B1 (en) * 1989-08-31 1991-12-06 Efi PHOTOSENSITIVE COMPOSITION BASED ON DIAZOUIC CONDENSATE FOR OFFSET PLATES.
JPH03125151A (en) * 1989-10-11 1991-05-28 Konica Corp Developing solution for damping-waterless photosensitive planographic printing plant
JPH03148662A (en) * 1989-11-03 1991-06-25 Konica Corp Developing solution for damping-waterless photosensitive planographic printing plate
JPH03148663A (en) * 1989-11-03 1991-06-25 Konica Corp Developing solution for damping-waterless photosensitive planographic printing plate
DE4430680A1 (en) * 1994-08-29 1996-03-07 Hoechst Ag Photosensitive mixture
JP2815332B2 (en) * 1995-12-18 1998-10-27 旭化成工業株式会社 Method for producing photosensitive composition
JP4458389B2 (en) 2000-05-01 2010-04-28 コダック株式会社 Photosensitive composition and photosensitive lithographic printing plate
JP4410714B2 (en) 2004-08-13 2010-02-03 富士フイルム株式会社 Method for producing support for lithographic printing plate
JP4499507B2 (en) 2004-08-23 2010-07-07 コダック株式会社 Planographic printing plate precursor
DE602006001142D1 (en) 2005-04-13 2008-06-26 Fujifilm Corp Method for producing a planographic printing plate support
JP5165197B2 (en) * 2005-12-12 2013-03-21 岡本化学工業株式会社 Planographic printing plate disposal and method for producing the same
EP2042338A3 (en) 2007-09-26 2010-03-10 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2042339B1 (en) 2007-09-26 2013-05-22 FUJIFILM Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
JP2009083106A (en) 2007-09-27 2009-04-23 Fujifilm Corp Lithographic printing plate surface protective agent and plate making method for lithographic printing plate
JP2009208140A (en) 2008-03-06 2009-09-17 Fujifilm Corp Manufacturing method of aluminum alloy sheet for planographic printing plate, aluminum alloy sheet for planographic printing plate and support for planographic printing plate manufactured by the method
JP2009234247A (en) 2008-03-07 2009-10-15 Fujifilm Corp Dampening water composition for lithographic printing and heat-set rotary offset printing process
JP5288268B2 (en) 2009-03-25 2013-09-11 富士フイルム株式会社 Dampening solution composition for lithographic printing and heat set-off ring printing method
JP5281130B2 (en) 2011-07-05 2013-09-04 富士フイルム株式会社 Dampening solution composition for lithographic printing

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2034654C2 (en) * 1970-07-13 1982-08-26 Hoechst Ag, 6000 Frankfurt Negative working copy solution and its use for the production of printing plates
IT948621B (en) * 1971-02-19 1973-06-11 Howson Algraphy Ltd PROCEDURE FOR PRODUCING LITHOGRAPHIC PRINTING PLATES AND PLATES THIS OBTAINED

Also Published As

Publication number Publication date
JPS50118802A (en) 1975-09-17
FR2262813A1 (en) 1975-09-26
DE2508618C2 (en) 1984-01-26
FR2262813B1 (en) 1977-04-15
DE2508618A1 (en) 1975-09-04
GB1505739A (en) 1978-03-30
CA1060252A (en) 1979-08-14

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