JPS5528414B2 - - Google Patents
Info
- Publication number
- JPS5528414B2 JPS5528414B2 JP5752072A JP5752072A JPS5528414B2 JP S5528414 B2 JPS5528414 B2 JP S5528414B2 JP 5752072 A JP5752072 A JP 5752072A JP 5752072 A JP5752072 A JP 5752072A JP S5528414 B2 JPS5528414 B2 JP S5528414B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5752072A JPS5528414B2 (enrdf_load_stackoverflow) | 1972-06-09 | 1972-06-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5752072A JPS5528414B2 (enrdf_load_stackoverflow) | 1972-06-09 | 1972-06-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4918472A JPS4918472A (enrdf_load_stackoverflow) | 1974-02-18 |
| JPS5528414B2 true JPS5528414B2 (enrdf_load_stackoverflow) | 1980-07-28 |
Family
ID=13057997
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5752072A Expired JPS5528414B2 (enrdf_load_stackoverflow) | 1972-06-09 | 1972-06-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5528414B2 (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5191955A (en) * | 1975-02-10 | 1976-08-12 | Tomeiseino suguretahoripuropirenseishiitono seizohoho | |
| JPS5346366U (enrdf_load_stackoverflow) * | 1976-09-27 | 1978-04-20 | ||
| JPS54157478A (en) * | 1978-06-01 | 1979-12-12 | Canon Inc | Alignment method |
| US4357540A (en) * | 1980-12-19 | 1982-11-02 | International Business Machines Corporation | Semiconductor device array mask inspection method and apparatus |
| JPS5818713A (ja) * | 1981-07-25 | 1983-02-03 | Nippon Kogaku Kk <Nikon> | 円板物体の位置決め装置 |
| BG50611A3 (bg) * | 1989-03-29 | 1992-09-15 | Chisso Corp | Непрозрачен формован продукт и метод за получаването му |
| JPH0637572B2 (ja) * | 1990-02-20 | 1994-05-18 | チッソ株式会社 | 真珠様光沢を有する延伸成形物およびその製造方法 |
| JP6127834B2 (ja) * | 2013-08-27 | 2017-05-17 | トヨタ自動車株式会社 | アライメント方法及びパターニング用マスク |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3497705A (en) * | 1968-02-12 | 1970-02-24 | Itek Corp | Mask alignment system using radial patterns and flying spot scanning |
-
1972
- 1972-06-09 JP JP5752072A patent/JPS5528414B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4918472A (enrdf_load_stackoverflow) | 1974-02-18 |