JPS5528056B2 - - Google Patents
Info
- Publication number
- JPS5528056B2 JPS5528056B2 JP15703776A JP15703776A JPS5528056B2 JP S5528056 B2 JPS5528056 B2 JP S5528056B2 JP 15703776 A JP15703776 A JP 15703776A JP 15703776 A JP15703776 A JP 15703776A JP S5528056 B2 JPS5528056 B2 JP S5528056B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15703776A JPS5381116A (en) | 1976-12-25 | 1976-12-25 | Radiation sensitive polymer and its working method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15703776A JPS5381116A (en) | 1976-12-25 | 1976-12-25 | Radiation sensitive polymer and its working method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5381116A JPS5381116A (en) | 1978-07-18 |
| JPS5528056B2 true JPS5528056B2 (th) | 1980-07-25 |
Family
ID=15640803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15703776A Granted JPS5381116A (en) | 1976-12-25 | 1976-12-25 | Radiation sensitive polymer and its working method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5381116A (th) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
| ZA794723B (en) * | 1978-09-11 | 1980-08-27 | Univ Miami | Anti-hypertensive agents |
| JPS5639539A (en) * | 1979-09-07 | 1981-04-15 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Pattern forming method |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| EP0494383B1 (de) * | 1990-12-20 | 1996-08-14 | Siemens Aktiengesellschaft | Photoresist |
| ES2090218T3 (es) * | 1990-12-20 | 1996-10-16 | Siemens Ag | Generacion estructural fotolitografica. |
| EP0608983B1 (en) * | 1993-01-25 | 1997-11-12 | AT&T Corp. | A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5050041A (th) * | 1973-09-03 | 1975-05-06 | ||
| JPS512430A (en) * | 1974-05-28 | 1976-01-10 | Ibm | Mechiru isopuchiru ketongenzozai |
| US3984582A (en) * | 1975-06-30 | 1976-10-05 | Ibm | Method for preparing positive resist image |
-
1976
- 1976-12-25 JP JP15703776A patent/JPS5381116A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5050041A (th) * | 1973-09-03 | 1975-05-06 | ||
| JPS512430A (en) * | 1974-05-28 | 1976-01-10 | Ibm | Mechiru isopuchiru ketongenzozai |
| US3984582A (en) * | 1975-06-30 | 1976-10-05 | Ibm | Method for preparing positive resist image |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5381116A (en) | 1978-07-18 |