JPS5527623B2 - - Google Patents
Info
- Publication number
- JPS5527623B2 JPS5527623B2 JP2505676A JP2505676A JPS5527623B2 JP S5527623 B2 JPS5527623 B2 JP S5527623B2 JP 2505676 A JP2505676 A JP 2505676A JP 2505676 A JP2505676 A JP 2505676A JP S5527623 B2 JPS5527623 B2 JP S5527623B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2505676A JPS52108380A (en) | 1976-03-10 | 1976-03-10 | Gassintroducing system for ionic plating apparatus of high frequency energization type |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2505676A JPS52108380A (en) | 1976-03-10 | 1976-03-10 | Gassintroducing system for ionic plating apparatus of high frequency energization type |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52108380A JPS52108380A (en) | 1977-09-10 |
| JPS5527623B2 true JPS5527623B2 (en:Method) | 1980-07-22 |
Family
ID=12155255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2505676A Granted JPS52108380A (en) | 1976-03-10 | 1976-03-10 | Gassintroducing system for ionic plating apparatus of high frequency energization type |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52108380A (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11269643A (ja) * | 1998-03-20 | 1999-10-05 | Toshiba Corp | 成膜装置およびそれを用いた成膜方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5346289Y2 (en:Method) * | 1974-04-05 | 1978-11-06 |
-
1976
- 1976-03-10 JP JP2505676A patent/JPS52108380A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11269643A (ja) * | 1998-03-20 | 1999-10-05 | Toshiba Corp | 成膜装置およびそれを用いた成膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52108380A (en) | 1977-09-10 |