JPS5526464A - Calibration method of radiation thermometer - Google Patents
Calibration method of radiation thermometerInfo
- Publication number
- JPS5526464A JPS5526464A JP9967178A JP9967178A JPS5526464A JP S5526464 A JPS5526464 A JP S5526464A JP 9967178 A JP9967178 A JP 9967178A JP 9967178 A JP9967178 A JP 9967178A JP S5526464 A JPS5526464 A JP S5526464A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- furnace
- thermometer
- calibration
- concave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 title abstract 2
- 230000005457 Black-body radiation Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
- 239000010931 gold Substances 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0806—Focusing or collimating elements, e.g. lenses or concave mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
- G01J5/53—Reference sources, e.g. standard lamps; Black bodies
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0275—Control or determination of height or distance or angle information for sensors or receivers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Radiation Pyrometers (AREA)
Abstract
PURPOSE:To make an accurate calibration possible even for a radiation thermometer having a measuring diameter larger than the target diameter of a radiator by using the magnified virtual image of the radiator for calibration generated by a concave mirror. CONSTITUTION:Black body furnace 10 is arranged with a slight inclination for the center axis of concave mirror 16, and mirror 16 is provided in the light path between standard thermometer 12 and calibrated thermometer 14 which are arranged in both sides of furnace 10. Various conditions of furnace 10 are so set that an isotropic black body radiation can be obtained sufficiently in the solid for all the surface of the concave mirror, and the reflection factor of mirror 16 is enhanced by subjecting the concave sphere of metal or glass to gold plating, and the hollow target part of furnace 10 is placed in the focal distance of mirror 16, and 1 to 10 magnifications can be obtained by adjusting the distance between them. In case of calibration, mirror 16 is rotated to measure the temperature of magnified virtual image 24 in the hollow of furnace 10 by thermometers 12 and 14, thereby calibratting thermometer 14.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9967178A JPS5526464A (en) | 1978-08-15 | 1978-08-15 | Calibration method of radiation thermometer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9967178A JPS5526464A (en) | 1978-08-15 | 1978-08-15 | Calibration method of radiation thermometer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5526464A true JPS5526464A (en) | 1980-02-25 |
Family
ID=14253489
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9967178A Pending JPS5526464A (en) | 1978-08-15 | 1978-08-15 | Calibration method of radiation thermometer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5526464A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4907895A (en) * | 1988-03-31 | 1990-03-13 | Ivac Corporation | Optical chopper for infrared thermometer |
US4969748A (en) * | 1989-04-13 | 1990-11-13 | Peak Systems, Inc. | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing |
US4984902A (en) * | 1989-04-13 | 1991-01-15 | Peak Systems, Inc. | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing |
-
1978
- 1978-08-15 JP JP9967178A patent/JPS5526464A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4907895A (en) * | 1988-03-31 | 1990-03-13 | Ivac Corporation | Optical chopper for infrared thermometer |
US4969748A (en) * | 1989-04-13 | 1990-11-13 | Peak Systems, Inc. | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing |
US4984902A (en) * | 1989-04-13 | 1991-01-15 | Peak Systems, Inc. | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing |
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