JPS5524693B2 - - Google Patents

Info

Publication number
JPS5524693B2
JPS5524693B2 JP10727276A JP10727276A JPS5524693B2 JP S5524693 B2 JPS5524693 B2 JP S5524693B2 JP 10727276 A JP10727276 A JP 10727276A JP 10727276 A JP10727276 A JP 10727276A JP S5524693 B2 JPS5524693 B2 JP S5524693B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10727276A
Other languages
Japanese (ja)
Other versions
JPS5333053A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10727276A priority Critical patent/JPS5333053A/ja
Priority to US05/831,393 priority patent/US4140547A/en
Publication of JPS5333053A publication Critical patent/JPS5333053A/ja
Publication of JPS5524693B2 publication Critical patent/JPS5524693B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Element Separation (AREA)
JP10727276A 1976-09-09 1976-09-09 Production of semiconductor device Granted JPS5333053A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10727276A JPS5333053A (en) 1976-09-09 1976-09-09 Production of semiconductor device
US05/831,393 US4140547A (en) 1976-09-09 1977-09-08 Method for manufacturing MOSFET devices by ion-implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10727276A JPS5333053A (en) 1976-09-09 1976-09-09 Production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5333053A JPS5333053A (en) 1978-03-28
JPS5524693B2 true JPS5524693B2 (US07122547-20061017-C00224.png) 1980-07-01

Family

ID=14454845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10727276A Granted JPS5333053A (en) 1976-09-09 1976-09-09 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5333053A (US07122547-20061017-C00224.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5840838A (ja) * 1981-09-03 1983-03-09 Toshiba Corp 半導体装置の製造方法
JPS57188866A (en) * 1981-05-18 1982-11-19 Hitachi Ltd Manufacture of semiconductor device
JPS58123721A (ja) * 1982-01-19 1983-07-23 Sumitomo Electric Ind Ltd 半導体結晶への不純物ド−ピング法
JPS58123722A (ja) * 1982-01-19 1983-07-23 Sumitomo Electric Ind Ltd 半導体結晶への不純物のド−ピング法
JPS58124227A (ja) * 1982-01-20 1983-07-23 Sumitomo Electric Ind Ltd 半導体結晶への不純物ド−ピング方法
US4418094A (en) * 1982-03-02 1983-11-29 Texas Instruments Incorporated Vertical-etch direct moat isolation process
JPH01194436A (ja) * 1988-01-29 1989-08-04 Nec Yamaguchi Ltd 半導体装置

Also Published As

Publication number Publication date
JPS5333053A (en) 1978-03-28

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