JPS5520210A - Manufacture of vanadium oxychloride - Google Patents
Manufacture of vanadium oxychlorideInfo
- Publication number
- JPS5520210A JPS5520210A JP8999878A JP8999878A JPS5520210A JP S5520210 A JPS5520210 A JP S5520210A JP 8999878 A JP8999878 A JP 8999878A JP 8999878 A JP8999878 A JP 8999878A JP S5520210 A JPS5520210 A JP S5520210A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reactor
- dust
- mixt
- cyclone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
PURPOSE: To obtain vanadium oxychloride in a high yield by feeding a mixed gas of chlorine gas and inert gas into a mixt. of V2O5 and carbon powder followed by fluidized reaction at a relatively low temp. without using an inert soild medium.
CONSTITUTION: A mixt. of finely divided V2O5 and carbon powder in a ratio of 6:1W10:1 by wt. is supplied to reactor 1 from silo 3 in which air is replaced by N2 gas. The vol. of Cl2 gas 10 and N2 gas 11 fed is controlled so that the temp. inside reactor 1 becomes 350±50°C, and VOCl3 is formed according to equations I,II. The reaction product gas is fed to cyclone 2, where part of dust is removed. Outlet gas 9 is introduced into a purification system through a dust collector and a liquefier. The dust separated in cyclone 2 mainly consists of V2O5 and C, and it is returned to reactor 1 through line 8.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8999878A JPS5520210A (en) | 1978-07-25 | 1978-07-25 | Manufacture of vanadium oxychloride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8999878A JPS5520210A (en) | 1978-07-25 | 1978-07-25 | Manufacture of vanadium oxychloride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5520210A true JPS5520210A (en) | 1980-02-13 |
| JPS567970B2 JPS567970B2 (en) | 1981-02-20 |
Family
ID=13986260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8999878A Granted JPS5520210A (en) | 1978-07-25 | 1978-07-25 | Manufacture of vanadium oxychloride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5520210A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0103940A1 (en) * | 1982-08-16 | 1984-03-28 | Stauffer Chemical Company | Process for preparing vanadium halides |
| JP2018506502A (en) * | 2015-01-30 | 2018-03-08 | インスティテュート オブ プロセス エンジニアリング，チャイニーズ アカデミー オブ サイエンシズＩｎｓｔｉｔｕｔｅ Ｏｆ Ｐｒｏｃｅｓｓ Ｅｎｇｉｎｅｅｒｉｎｇ， Ｃｈｉｎｅｓｅ Ａｃａｄｅｍｙ Ｏｆ Ｓｃｉｅｎｃｅｓ | Purification system and method for divanadium pentoxide |
| JP2018509371A (en) * | 2015-01-30 | 2018-04-05 | インスティテュート オブ プロセス エンジニアリング，チャイニーズ アカデミー オブ サイエンシズＩｎｓｔｉｔｕｔｅ Ｏｆ Ｐｒｏｃｅｓｓ Ｅｎｇｉｎｅｅｒｉｎｇ， Ｃｈｉｎｅｓｅ Ａｃａｄｅｍｙ Ｏｆ Ｓｃｉｅｎｃｅｓ | Manufacturing system and manufacturing method of divanadium pentoxide powder |
-
1978
- 1978-07-25 JP JP8999878A patent/JPS5520210A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0103940A1 (en) * | 1982-08-16 | 1984-03-28 | Stauffer Chemical Company | Process for preparing vanadium halides |
| JP2018506502A (en) * | 2015-01-30 | 2018-03-08 | インスティテュート オブ プロセス エンジニアリング，チャイニーズ アカデミー オブ サイエンシズＩｎｓｔｉｔｕｔｅ Ｏｆ Ｐｒｏｃｅｓｓ Ｅｎｇｉｎｅｅｒｉｎｇ， Ｃｈｉｎｅｓｅ Ａｃａｄｅｍｙ Ｏｆ Ｓｃｉｅｎｃｅｓ | Purification system and method for divanadium pentoxide |
| JP2018509371A (en) * | 2015-01-30 | 2018-04-05 | インスティテュート オブ プロセス エンジニアリング，チャイニーズ アカデミー オブ サイエンシズＩｎｓｔｉｔｕｔｅ Ｏｆ Ｐｒｏｃｅｓｓ Ｅｎｇｉｎｅｅｒｉｎｇ， Ｃｈｉｎｅｓｅ Ａｃａｄｅｍｙ Ｏｆ Ｓｃｉｅｎｃｅｓ | Manufacturing system and manufacturing method of divanadium pentoxide powder |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS567970B2 (en) | 1981-02-20 |
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