JPS5518595A - Catalyst solution for nonelectrolytic metal coating - Google Patents

Catalyst solution for nonelectrolytic metal coating

Info

Publication number
JPS5518595A
JPS5518595A JP9251979A JP9251979A JPS5518595A JP S5518595 A JPS5518595 A JP S5518595A JP 9251979 A JP9251979 A JP 9251979A JP 9251979 A JP9251979 A JP 9251979A JP S5518595 A JPS5518595 A JP S5518595A
Authority
JP
Japan
Prior art keywords
nonelectrolytic
metal coating
catalyst solution
catalyst
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9251979A
Other languages
Japanese (ja)
Inventor
Kagunatsushi Roberuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alfachimici SpA
Original Assignee
Alfachimici SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alfachimici SpA filed Critical Alfachimici SpA
Publication of JPS5518595A publication Critical patent/JPS5518595A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Catalysts (AREA)
JP9251979A 1978-07-25 1979-07-20 Catalyst solution for nonelectrolytic metal coating Pending JPS5518595A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT68768/78A IT1107840B (en) 1978-07-25 1978-07-25 CATALYTIC SOLUTION FOR ANELECTRIC METAL DEPOSITION

Publications (1)

Publication Number Publication Date
JPS5518595A true JPS5518595A (en) 1980-02-08

Family

ID=11310525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9251979A Pending JPS5518595A (en) 1978-07-25 1979-07-20 Catalyst solution for nonelectrolytic metal coating

Country Status (6)

Country Link
US (1) US4244739A (en)
JP (1) JPS5518595A (en)
DE (1) DE2928699A1 (en)
FR (1) FR2432055A1 (en)
GB (1) GB2025782B (en)
IT (1) IT1107840B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04365876A (en) * 1991-06-13 1992-12-17 Ishihara Chem Co Ltd Catalyst liquid for copper base selecting electroless plating
JP2004513229A (en) * 2000-11-01 2004-04-30 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Method for electroless metal plating
JP2004190066A (en) * 2002-12-09 2004-07-08 Yutaka Fujiwara Catalyst composition for electroless plating

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3376852D1 (en) * 1982-05-26 1988-07-07 Macdermid Inc Catalyst solutions for activating non-conductive substrates and electroless plating process
US4863758A (en) * 1982-05-26 1989-09-05 Macdermid, Incorporated Catalyst solutions for activating non-conductive substrates and electroless plating process
US4741786A (en) * 1986-06-10 1988-05-03 Stanadyne, Inc. Cold drawn free-machining steel bar including bismuth
US5264288A (en) * 1992-10-01 1993-11-23 Ppg Industries, Inc. Electroless process using silylated polyamine-noble metal complexes
US5391395A (en) * 1992-12-30 1995-02-21 Witco Corporation Method of preparing substrates for memory disk applications
EP1162289A1 (en) * 2000-06-08 2001-12-12 Lucent Technologies Inc. Palladium electroplating bath and process for electroplating
AU2001294928A1 (en) * 2000-11-06 2002-05-15 Macdermid, Incorporated Catalyst solutions useful in activating substrates for subsequent plating
US20020062760A1 (en) * 2000-11-06 2002-05-30 Ronald Redline Catalyst solutions useful in activating substrates for subsequent plating
US6645557B2 (en) 2001-10-17 2003-11-11 Atotech Deutschland Gmbh Metallization of non-conductive surfaces with silver catalyst and electroless metal compositions
US20050170650A1 (en) * 2004-01-26 2005-08-04 Hongbin Fang Electroless palladium nitrate activation prior to cobalt-alloy deposition
US8585811B2 (en) * 2010-09-03 2013-11-19 Omg Electronic Chemicals, Llc Electroless nickel alloy plating bath and process for depositing thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650913A (en) * 1969-09-08 1972-03-21 Macdermid Inc An electroless plating process employing a specially prepared palladium-tin activator solution
US3682671A (en) * 1970-02-05 1972-08-08 Kollmorgen Corp Novel precious metal sensitizing solutions
US3874882A (en) * 1972-02-09 1975-04-01 Shipley Co Catalyst solution for electroless deposition of metal on substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04365876A (en) * 1991-06-13 1992-12-17 Ishihara Chem Co Ltd Catalyst liquid for copper base selecting electroless plating
JP2004513229A (en) * 2000-11-01 2004-04-30 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Method for electroless metal plating
JP2004190066A (en) * 2002-12-09 2004-07-08 Yutaka Fujiwara Catalyst composition for electroless plating

Also Published As

Publication number Publication date
GB2025782B (en) 1983-04-27
DE2928699A1 (en) 1980-02-07
US4244739A (en) 1981-01-13
DE2928699C2 (en) 1988-03-24
IT1107840B (en) 1985-12-02
FR2432055B1 (en) 1981-12-04
GB2025782A (en) 1980-01-30
IT7868768A0 (en) 1978-07-25
FR2432055A1 (en) 1980-02-22

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