JPS5518052B2 - - Google Patents

Info

Publication number
JPS5518052B2
JPS5518052B2 JP7163875A JP7163875A JPS5518052B2 JP S5518052 B2 JPS5518052 B2 JP S5518052B2 JP 7163875 A JP7163875 A JP 7163875A JP 7163875 A JP7163875 A JP 7163875A JP S5518052 B2 JPS5518052 B2 JP S5518052B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7163875A
Other languages
Japanese (ja)
Other versions
JPS51147186A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50071638A priority Critical patent/JPS51147186A/ja
Publication of JPS51147186A publication Critical patent/JPS51147186A/ja
Publication of JPS5518052B2 publication Critical patent/JPS5518052B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6704Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6708Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device for preventing the kink effect or the snapback effect, e.g. discharging the minority carriers of the channel region for preventing bipolar effect

Landscapes

  • Non-Volatile Memory (AREA)
  • Thin Film Transistor (AREA)
JP50071638A 1975-06-12 1975-06-12 Semiconductor device Granted JPS51147186A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50071638A JPS51147186A (en) 1975-06-12 1975-06-12 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50071638A JPS51147186A (en) 1975-06-12 1975-06-12 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS51147186A JPS51147186A (en) 1976-12-17
JPS5518052B2 true JPS5518052B2 (en, 2012) 1980-05-16

Family

ID=13466379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50071638A Granted JPS51147186A (en) 1975-06-12 1975-06-12 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS51147186A (en, 2012)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313876U (en, 2012) * 1986-07-15 1988-01-29
JPH01254545A (ja) * 1988-03-31 1989-10-11 Dainippon Printing Co Ltd 金属蓋付容器

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5799777A (en) * 1980-12-12 1982-06-21 Toshiba Corp Metal oxide semiconductor type semiconductor device
JPS6115369A (ja) * 1984-07-02 1986-01-23 Nippon Telegr & Teleph Corp <Ntt> 半導体装置及びその製造方法
SE461490B (sv) * 1987-08-24 1990-02-19 Asea Ab Mos-transistor utbildad paa ett isolerande underlag
JP2507567B2 (ja) * 1988-11-25 1996-06-12 三菱電機株式会社 絶縁体基板上の半導体層に形成されたmos型電界効果トランジスタ
US5264721A (en) * 1989-04-29 1993-11-23 Fujitsu Limited Insulated-gate FET on an SOI-structure
JP2519541B2 (ja) * 1989-09-06 1996-07-31 三菱電機株式会社 半導体装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313876U (en, 2012) * 1986-07-15 1988-01-29
JPH01254545A (ja) * 1988-03-31 1989-10-11 Dainippon Printing Co Ltd 金属蓋付容器

Also Published As

Publication number Publication date
JPS51147186A (en) 1976-12-17

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