JPS5517376B2 - - Google Patents
Info
- Publication number
- JPS5517376B2 JPS5517376B2 JP11336676A JP11336676A JPS5517376B2 JP S5517376 B2 JPS5517376 B2 JP S5517376B2 JP 11336676 A JP11336676 A JP 11336676A JP 11336676 A JP11336676 A JP 11336676A JP S5517376 B2 JPS5517376 B2 JP S5517376B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11336676A JPS5339127A (en) | 1976-09-21 | 1976-09-21 | Photo resist frilling agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11336676A JPS5339127A (en) | 1976-09-21 | 1976-09-21 | Photo resist frilling agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5339127A JPS5339127A (en) | 1978-04-10 |
| JPS5517376B2 true JPS5517376B2 (enExample) | 1980-05-10 |
Family
ID=14610446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11336676A Granted JPS5339127A (en) | 1976-09-21 | 1976-09-21 | Photo resist frilling agent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5339127A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59138240U (ja) * | 1983-03-04 | 1984-09-14 | 日立精工株式会社 | 固体高速大電流スイツチ素子 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54132031A (en) * | 1978-04-05 | 1979-10-13 | Okamura Corp | Ignition plug free from carbon attachment |
| JPS61163342A (ja) * | 1985-01-14 | 1986-07-24 | Ricoh Co Ltd | フオトレジスト除去方法 |
| CN105467782A (zh) * | 2015-12-15 | 2016-04-06 | 吴来友 | 一种去胶液及其制备方法 |
| JPWO2019111479A1 (ja) * | 2017-12-07 | 2020-12-10 | 株式会社Ｊｃｕ | レジストの剥離液 |
| JP7291704B2 (ja) * | 2018-07-27 | 2023-06-15 | 花王株式会社 | 洗浄方法 |
-
1976
- 1976-09-21 JP JP11336676A patent/JPS5339127A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59138240U (ja) * | 1983-03-04 | 1984-09-14 | 日立精工株式会社 | 固体高速大電流スイツチ素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5339127A (en) | 1978-04-10 |