JPS55167653U - - Google Patents
Info
- Publication number
- JPS55167653U JPS55167653U JP6708679U JP6708679U JPS55167653U JP S55167653 U JPS55167653 U JP S55167653U JP 6708679 U JP6708679 U JP 6708679U JP 6708679 U JP6708679 U JP 6708679U JP S55167653 U JPS55167653 U JP S55167653U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1979067086U JPS629715Y2 (zh) | 1979-05-18 | 1979-05-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1979067086U JPS629715Y2 (zh) | 1979-05-18 | 1979-05-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55167653U true JPS55167653U (zh) | 1980-12-02 |
JPS629715Y2 JPS629715Y2 (zh) | 1987-03-06 |
Family
ID=29301016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1979067086U Expired JPS629715Y2 (zh) | 1979-05-18 | 1979-05-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS629715Y2 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6798491B2 (en) | 1996-11-28 | 2004-09-28 | Nikon Corporation | Exposure apparatus and an exposure method |
US6819425B2 (en) | 2000-08-24 | 2004-11-16 | Asml Netherland B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7289212B2 (en) | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
US7561270B2 (en) | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5147026A (ja) * | 1974-08-21 | 1976-04-22 | Ciba Geigy | Biizukeijonoganryososeibutsunoseizoho |
JPS5421278U (zh) * | 1977-07-14 | 1979-02-10 | ||
JPS5455274U (zh) * | 1977-09-26 | 1979-04-17 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5123800A (ja) * | 1974-08-21 | 1976-02-25 | Omron Tateisi Electronics Co | Ryokinshijisochi |
-
1979
- 1979-05-18 JP JP1979067086U patent/JPS629715Y2/ja not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5147026A (ja) * | 1974-08-21 | 1976-04-22 | Ciba Geigy | Biizukeijonoganryososeibutsunoseizoho |
JPS5421278U (zh) * | 1977-07-14 | 1979-02-10 | ||
JPS5455274U (zh) * | 1977-09-26 | 1979-04-17 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6798491B2 (en) | 1996-11-28 | 2004-09-28 | Nikon Corporation | Exposure apparatus and an exposure method |
US7177008B2 (en) | 1996-11-28 | 2007-02-13 | Nikon Corporation | Exposure apparatus and method |
US7256869B2 (en) | 1996-11-28 | 2007-08-14 | Nikon Corporation | Exposure apparatus and an exposure method |
US6819425B2 (en) | 2000-08-24 | 2004-11-16 | Asml Netherland B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7289212B2 (en) | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
US7561270B2 (en) | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
US7633619B2 (en) | 2000-08-24 | 2009-12-15 | Asml Netherlands B.V. | Calibrating a lithographic apparatus |
US7940392B2 (en) | 2000-08-24 | 2011-05-10 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
Also Published As
Publication number | Publication date |
---|---|
JPS629715Y2 (zh) | 1987-03-06 |