JPS55164647U - - Google Patents

Info

Publication number
JPS55164647U
JPS55164647U JP1979063514U JP6351479U JPS55164647U JP S55164647 U JPS55164647 U JP S55164647U JP 1979063514 U JP1979063514 U JP 1979063514U JP 6351479 U JP6351479 U JP 6351479U JP S55164647 U JPS55164647 U JP S55164647U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1979063514U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1979063514U priority Critical patent/JPS55164647U/ja
Priority to US06/145,281 priority patent/US4307172A/en
Priority to DE19803017696 priority patent/DE3017696A1/de
Publication of JPS55164647U publication Critical patent/JPS55164647U/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP1979063514U 1979-05-11 1979-05-11 Pending JPS55164647U (US20020095090A1-20020718-M00002.png)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1979063514U JPS55164647U (US20020095090A1-20020718-M00002.png) 1979-05-11 1979-05-11
US06/145,281 US4307172A (en) 1979-05-11 1980-04-30 Imaging light-sensitive material with etchable opaque polyamide underlayer and light-sensitive resist overlayer
DE19803017696 DE3017696A1 (de) 1979-05-11 1980-05-08 Lichtempfindliches bilderzeugungsmaterial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979063514U JPS55164647U (US20020095090A1-20020718-M00002.png) 1979-05-11 1979-05-11

Publications (1)

Publication Number Publication Date
JPS55164647U true JPS55164647U (US20020095090A1-20020718-M00002.png) 1980-11-26

Family

ID=13231399

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979063514U Pending JPS55164647U (US20020095090A1-20020718-M00002.png) 1979-05-11 1979-05-11

Country Status (3)

Country Link
US (1) US4307172A (US20020095090A1-20020718-M00002.png)
JP (1) JPS55164647U (US20020095090A1-20020718-M00002.png)
DE (1) DE3017696A1 (US20020095090A1-20020718-M00002.png)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4423137A (en) * 1980-10-28 1983-12-27 Quixote Corporation Contact printing and etching method of making high density recording medium
DE3270540D1 (en) * 1981-02-06 1986-05-22 Crosfield Electronics Ltd Formation of print surfaces
EP0058737B1 (en) * 1981-02-25 1985-05-15 E.I. Du Pont De Nemours And Company Flexographic printing plates containing blended adhesives
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4748102A (en) * 1986-05-29 1988-05-31 Weller Jr Edward L Photoimaging process using water removable coatings
JPH0750329B2 (ja) * 1986-06-23 1995-05-31 富士写真フイルム株式会社 画像形成材料
JPH0690511B2 (ja) * 1986-06-23 1994-11-14 富士写真フイルム株式会社 感光材料
JP2720224B2 (ja) * 1990-06-15 1998-03-04 富士写真フイルム株式会社 感光性平版印刷版
US5397684A (en) * 1993-04-27 1995-03-14 International Business Machines Corporation Antireflective polyimide dielectric for photolithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4831321U (US20020095090A1-20020718-M00002.png) * 1971-01-26 1973-04-17
JPS4945321A (US20020095090A1-20020718-M00002.png) * 1972-09-08 1974-04-30

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
JPS49441B1 (US20020095090A1-20020718-M00002.png) * 1968-08-14 1974-01-08
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
GB1366304A (en) * 1970-08-17 1974-09-11 Norprint Ltd Photographic resist transfer materials
GB1427932A (en) * 1972-11-03 1976-03-10 Ici Ltd Diazotype materials
GB1441982A (en) * 1973-01-18 1976-07-07 Autotype Co Ltd Dry transfer sheets
JPS5421089B2 (US20020095090A1-20020718-M00002.png) * 1973-05-29 1979-07-27
JPS5420719A (en) * 1977-07-15 1979-02-16 Fuji Photo Film Co Ltd Photosensitive material for image formation and image formation method
JPS5540406A (en) * 1978-09-14 1980-03-21 Oji Paper Co Ltd Photosensitive lithographic printing plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4831321U (US20020095090A1-20020718-M00002.png) * 1971-01-26 1973-04-17
JPS4945321A (US20020095090A1-20020718-M00002.png) * 1972-09-08 1974-04-30

Also Published As

Publication number Publication date
DE3017696A1 (de) 1980-11-13
US4307172A (en) 1981-12-22

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