JPS55153935A - Photosensitive resin composition for forming relief plate - Google Patents

Photosensitive resin composition for forming relief plate

Info

Publication number
JPS55153935A
JPS55153935A JP4920579A JP4920579A JPS55153935A JP S55153935 A JPS55153935 A JP S55153935A JP 4920579 A JP4920579 A JP 4920579A JP 4920579 A JP4920579 A JP 4920579A JP S55153935 A JPS55153935 A JP S55153935A
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin composition
amino
relief plate
aminonaphthoquinone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4920579A
Other languages
Japanese (ja)
Other versions
JPS5740499B2 (en
Inventor
Toshiaki Fujimura
Yoshihiro Kasho
Kosaku Onodera
Shinichi Tanaka
Kuniomi Eto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP4920579A priority Critical patent/JPS55153935A/en
Publication of JPS55153935A publication Critical patent/JPS55153935A/en
Publication of JPS5740499B2 publication Critical patent/JPS5740499B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To obtain a photosensitive resin composition with superior sensitivity balance by blending a specified aminonaphthoquinone into a photosensitive resin. CONSTITUTION:0.005-0.5 pts.wt. of an aminonaphthoquinone such as 2-amino- 1,4-naphthoquinone or 3-amino-1,2-naphthoquinone represented by formula I or II (where each of R1-R5 is H, alkyl, aryl, hydroxyl, alkoxy, halogen, a sulfonic acid group, amino or alkylamino, and each of R6 and R7 is H, alkyl, aryl, an alicyclic group or allyl) is blended into 100 parts of a photosensitive resin prepared by mixing a soluble polymer such as polyamide or polyester and a photopolymerizable unsatd. compound such as methacrylic acid or acrylamide, and to this blend are added 0.1-10 parts of a photopolymerization initiator such as benzophenone or benzil, giving a photosensitive resin composition.
JP4920579A 1979-04-20 1979-04-20 Photosensitive resin composition for forming relief plate Granted JPS55153935A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4920579A JPS55153935A (en) 1979-04-20 1979-04-20 Photosensitive resin composition for forming relief plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4920579A JPS55153935A (en) 1979-04-20 1979-04-20 Photosensitive resin composition for forming relief plate

Publications (2)

Publication Number Publication Date
JPS55153935A true JPS55153935A (en) 1980-12-01
JPS5740499B2 JPS5740499B2 (en) 1982-08-27

Family

ID=12824477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4920579A Granted JPS55153935A (en) 1979-04-20 1979-04-20 Photosensitive resin composition for forming relief plate

Country Status (1)

Country Link
JP (1) JPS55153935A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6333134B1 (en) 1993-04-30 2001-12-25 Toyo Boseki Kabushiki Kaisha Multilayered photopolymer element including sensitivity controlling agents
WO2005088395A3 (en) * 2004-03-11 2009-04-02 Worcester Polytech Inst Systems and methods for sub-wavelength imaging
JP2011208136A (en) * 2010-03-11 2011-10-20 Kuraray Co Ltd Crosslinkable composition, crosslinked product, process for production thereof, and multilayer structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6333134B1 (en) 1993-04-30 2001-12-25 Toyo Boseki Kabushiki Kaisha Multilayered photopolymer element including sensitivity controlling agents
WO2005088395A3 (en) * 2004-03-11 2009-04-02 Worcester Polytech Inst Systems and methods for sub-wavelength imaging
JP2011208136A (en) * 2010-03-11 2011-10-20 Kuraray Co Ltd Crosslinkable composition, crosslinked product, process for production thereof, and multilayer structure

Also Published As

Publication number Publication date
JPS5740499B2 (en) 1982-08-27

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