JPS55151046A - Resin composition - Google Patents

Resin composition

Info

Publication number
JPS55151046A
JPS55151046A JP5861179A JP5861179A JPS55151046A JP S55151046 A JPS55151046 A JP S55151046A JP 5861179 A JP5861179 A JP 5861179A JP 5861179 A JP5861179 A JP 5861179A JP S55151046 A JPS55151046 A JP S55151046A
Authority
JP
Japan
Prior art keywords
antistatic agent
wax
parts
antistatic
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5861179A
Other languages
Japanese (ja)
Other versions
JPS6028306B2 (en
Inventor
Hiroharu Tanaka
Junji Yotsuyanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP5861179A priority Critical patent/JPS6028306B2/en
Publication of JPS55151046A publication Critical patent/JPS55151046A/en
Publication of JPS6028306B2 publication Critical patent/JPS6028306B2/en
Expired legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE: To prepare a resin composition giving an oriented product, especially a biaxially oriented film which can be made antistatic by the use of only a small amount of antistatic agent, by compounding a polypropylene resin containing an antistatic agent with a specific crystalline wax.
CONSTITUTION: The objective composition is prepared by compounding (A) 100 parts by weight of an isotactic polypropylene pref. having heptane extraction residue of ≥95% and a melt flow index of 0.1W5.0g/10min, (B) 0.5W5.0, pref. 1.3W3.0 parts of crystalline wax composed of 45W60C saturated straight-chain hydrocarbons synthesized by Fischer-Torpsch process, and (C) 0.1W2.0 parts of an antistatic agent. The antistatic agent migrates to the wax in the course of forming the undrawn film, and the wax migrates to the surface of the oriented product during drawing, thereby forming a wax layer containing the antistatic agent in relatively high concentration and giving sufficiently high antistatic effect to the film.
COPYRIGHT: (C)1980,JPO&Japio
JP5861179A 1979-05-15 1979-05-15 resin composition Expired JPS6028306B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5861179A JPS6028306B2 (en) 1979-05-15 1979-05-15 resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5861179A JPS6028306B2 (en) 1979-05-15 1979-05-15 resin composition

Publications (2)

Publication Number Publication Date
JPS55151046A true JPS55151046A (en) 1980-11-25
JPS6028306B2 JPS6028306B2 (en) 1985-07-04

Family

ID=13089324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5861179A Expired JPS6028306B2 (en) 1979-05-15 1979-05-15 resin composition

Country Status (1)

Country Link
JP (1) JPS6028306B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254737A (en) * 1985-09-04 1987-03-10 Kao Corp Additive composition for synthetic resin

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01158003U (en) * 1988-04-20 1989-10-31

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6254737A (en) * 1985-09-04 1987-03-10 Kao Corp Additive composition for synthetic resin

Also Published As

Publication number Publication date
JPS6028306B2 (en) 1985-07-04

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