JPS55142984A - Vacuum exhauster - Google Patents

Vacuum exhauster

Info

Publication number
JPS55142984A
JPS55142984A JP5036279A JP5036279A JPS55142984A JP S55142984 A JPS55142984 A JP S55142984A JP 5036279 A JP5036279 A JP 5036279A JP 5036279 A JP5036279 A JP 5036279A JP S55142984 A JPS55142984 A JP S55142984A
Authority
JP
Japan
Prior art keywords
chevron
liquid helium
radiation heat
cryopanel
heat absorber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5036279A
Other languages
Japanese (ja)
Inventor
Shoji Isobe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5036279A priority Critical patent/JPS55142984A/en
Publication of JPS55142984A publication Critical patent/JPS55142984A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To minimize the heat of radiation transmitted to liquid helium and reduce the consumption of the liquid helium by making the chevron surface facing a cryopanel side such a surface that no radiation heat absorber is coated in order to practically maximize its reflection factor.
CONSTITUTION: Of four chevron surfaces provided vertically and before and behind of the channel parts 28 of the chevron baffle 20, only the surface 30A facing the cryopanel 12 side is polished for finishing so as to obtain a mirror state having a maximum reflection factor, and the other three chevron surfaces 30 are coated with a black paint as a radiation heat absorber. Thus, the external radiation heat QF is reflected at the chevron surface 30 at each stage and absorbed by the black paint as a radiation heat absorber each time it is reflected, whereby no heating of the liquid helium occurs due to its arrival to the cryopanel 12. Thus, the consumption of expensive liquid helium can be reduced.
COPYRIGHT: (C)1980,JPO&Japio
JP5036279A 1979-04-25 1979-04-25 Vacuum exhauster Pending JPS55142984A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5036279A JPS55142984A (en) 1979-04-25 1979-04-25 Vacuum exhauster

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5036279A JPS55142984A (en) 1979-04-25 1979-04-25 Vacuum exhauster

Publications (1)

Publication Number Publication Date
JPS55142984A true JPS55142984A (en) 1980-11-07

Family

ID=12856773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5036279A Pending JPS55142984A (en) 1979-04-25 1979-04-25 Vacuum exhauster

Country Status (1)

Country Link
JP (1) JPS55142984A (en)

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