JPS5514140B2 - - Google Patents
Info
- Publication number
- JPS5514140B2 JPS5514140B2 JP317776A JP317776A JPS5514140B2 JP S5514140 B2 JPS5514140 B2 JP S5514140B2 JP 317776 A JP317776 A JP 317776A JP 317776 A JP317776 A JP 317776A JP S5514140 B2 JPS5514140 B2 JP S5514140B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP317776A JPS5286983A (en) | 1976-01-16 | 1976-01-16 | Ion plating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP317776A JPS5286983A (en) | 1976-01-16 | 1976-01-16 | Ion plating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5286983A JPS5286983A (en) | 1977-07-20 |
| JPS5514140B2 true JPS5514140B2 (US06420036-20020716-C00037.png) | 1980-04-14 |
Family
ID=11550095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP317776A Granted JPS5286983A (en) | 1976-01-16 | 1976-01-16 | Ion plating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5286983A (US06420036-20020716-C00037.png) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018037819A1 (ja) | 2016-08-23 | 2018-03-01 | 小林 光 | 配合物及びその製造方法、並びに水素供給方法 |
| WO2019021769A1 (ja) | 2017-07-27 | 2019-01-31 | 国立大学法人大阪大学 | 薬剤及びその製造方法 |
| WO2020152985A1 (ja) | 2019-01-24 | 2020-07-30 | 国立大学法人大阪大学 | 薬剤及びその製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4974178A (US06420036-20020716-C00037.png) * | 1972-11-18 | 1974-07-17 |
-
1976
- 1976-01-16 JP JP317776A patent/JPS5286983A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4974178A (US06420036-20020716-C00037.png) * | 1972-11-18 | 1974-07-17 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018037819A1 (ja) | 2016-08-23 | 2018-03-01 | 小林 光 | 配合物及びその製造方法、並びに水素供給方法 |
| WO2019021769A1 (ja) | 2017-07-27 | 2019-01-31 | 国立大学法人大阪大学 | 薬剤及びその製造方法 |
| WO2020152985A1 (ja) | 2019-01-24 | 2020-07-30 | 国立大学法人大阪大学 | 薬剤及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5286983A (en) | 1977-07-20 |
