JPS55137519A - Slit exposure lighting device - Google Patents

Slit exposure lighting device

Info

Publication number
JPS55137519A
JPS55137519A JP4415879A JP4415879A JPS55137519A JP S55137519 A JPS55137519 A JP S55137519A JP 4415879 A JP4415879 A JP 4415879A JP 4415879 A JP4415879 A JP 4415879A JP S55137519 A JPS55137519 A JP S55137519A
Authority
JP
Japan
Prior art keywords
scanning
reflecting mirror
lighting system
main
slit exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4415879A
Other languages
Japanese (ja)
Other versions
JPS6261130B2 (en
Inventor
Junichi Kitabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP4415879A priority Critical patent/JPS55137519A/en
Publication of JPS55137519A publication Critical patent/JPS55137519A/en
Publication of JPS6261130B2 publication Critical patent/JPS6261130B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Optical Systems Of Projection Type Copiers (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)

Abstract

PURPOSE: To let the device suited for high-speed lighting scanning and increase condensing light quantity by so constituting the device that the moving axis of a scanning reflecting mirror and the moving axis of the main lighting system have mutually different inclinations.
CONSTITUTION: In the slit exposure lighting system which radiates the luminous flux emitted from the main lighting system 3 consisting of a light source 1 and main reflecting mirror 2 through a scanning reflecting mirror 4 and moves the main reflecting mirror 2 and scanning reflecting mirror 4 both diagonally, the scanning reflecting mirror 4 is moved not in the AA', BB' directions parallel to the moving direction CD of the main lighting system 3 but in parallel to the AA" line and BB" line. In this case, the length AA'>AA" of the segment and therefore the scanning distance of the scanning reflecting mirror 4 becomes short, high-speed scanning becomes possible and condensing characteristic becomes good.
COPYRIGHT: (C)1980,JPO&Japio
JP4415879A 1979-04-13 1979-04-13 Slit exposure lighting device Granted JPS55137519A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4415879A JPS55137519A (en) 1979-04-13 1979-04-13 Slit exposure lighting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4415879A JPS55137519A (en) 1979-04-13 1979-04-13 Slit exposure lighting device

Publications (2)

Publication Number Publication Date
JPS55137519A true JPS55137519A (en) 1980-10-27
JPS6261130B2 JPS6261130B2 (en) 1987-12-19

Family

ID=12683798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4415879A Granted JPS55137519A (en) 1979-04-13 1979-04-13 Slit exposure lighting device

Country Status (1)

Country Link
JP (1) JPS55137519A (en)

Also Published As

Publication number Publication date
JPS6261130B2 (en) 1987-12-19

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