JPS55127439A - Production of aromatic polyamide film - Google Patents

Production of aromatic polyamide film

Info

Publication number
JPS55127439A
JPS55127439A JP3500779A JP3500779A JPS55127439A JP S55127439 A JPS55127439 A JP S55127439A JP 3500779 A JP3500779 A JP 3500779A JP 3500779 A JP3500779 A JP 3500779A JP S55127439 A JPS55127439 A JP S55127439A
Authority
JP
Japan
Prior art keywords
film
less
production
arom
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3500779A
Other languages
Japanese (ja)
Inventor
Junichi Tamura
Keizo Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP3500779A priority Critical patent/JPS55127439A/en
Publication of JPS55127439A publication Critical patent/JPS55127439A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To produce title film having good electrical characteristics, heat resistance and mechanical characteristics, by a method wherein arom. polyamide film is irradiated with electron beams of a specified dose.
CONSTITUTION: An arom. polyamide polymer film having not less than 75mol% of a repeating structural unit of formula I (wherein Ar1, Ar2 are the same or different t gp. and each is radical of formula II, III, IV or V; R is a lower alkyl, lower alkoxy, halogen, nitro; n is 0W4) is mono- or biaxially oriented at least 1.1 times as long. Then the film is irradiated with electron beams of a dose of 1W100Mrad, preferably 5W50Mrad. The film is heat-treated at a temp. of not less than 250°C, preferably not less than 300°C.
COPYRIGHT: (C)1980,JPO&Japio
JP3500779A 1979-03-27 1979-03-27 Production of aromatic polyamide film Pending JPS55127439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3500779A JPS55127439A (en) 1979-03-27 1979-03-27 Production of aromatic polyamide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3500779A JPS55127439A (en) 1979-03-27 1979-03-27 Production of aromatic polyamide film

Publications (1)

Publication Number Publication Date
JPS55127439A true JPS55127439A (en) 1980-10-02

Family

ID=12430024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3500779A Pending JPS55127439A (en) 1979-03-27 1979-03-27 Production of aromatic polyamide film

Country Status (1)

Country Link
JP (1) JPS55127439A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5159973A (en) * 1974-11-21 1976-05-25 Fujimori Kogyo Co NETSUSHIUSHIKUSEIFUIRUMU OYOBI TEEPUNO SEIHO
JPS53106779A (en) * 1977-03-01 1978-09-18 Gunze Kk Production of easily tearable biaxzally stretched polypropylene film
JPS53123474A (en) * 1977-04-04 1978-10-27 Grace W R & Co Film irradiating method and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5159973A (en) * 1974-11-21 1976-05-25 Fujimori Kogyo Co NETSUSHIUSHIKUSEIFUIRUMU OYOBI TEEPUNO SEIHO
JPS53106779A (en) * 1977-03-01 1978-09-18 Gunze Kk Production of easily tearable biaxzally stretched polypropylene film
JPS53123474A (en) * 1977-04-04 1978-10-27 Grace W R & Co Film irradiating method and apparatus

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