JPS5512732B2 - - Google Patents

Info

Publication number
JPS5512732B2
JPS5512732B2 JP4850776A JP4850776A JPS5512732B2 JP S5512732 B2 JPS5512732 B2 JP S5512732B2 JP 4850776 A JP4850776 A JP 4850776A JP 4850776 A JP4850776 A JP 4850776A JP S5512732 B2 JPS5512732 B2 JP S5512732B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4850776A
Other languages
Japanese (ja)
Other versions
JPS52132675A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4850776A priority Critical patent/JPS52132675A/ja
Priority to US05/787,495 priority patent/US4179326A/en
Priority to SE7704276A priority patent/SE432162B/xx
Priority to GB16011/77A priority patent/GB1575578A/en
Priority to IT22668/77A priority patent/IT1114781B/it
Priority to FR7712288A priority patent/FR2348983A1/fr
Priority to DE2718026A priority patent/DE2718026C3/de
Publication of JPS52132675A publication Critical patent/JPS52132675A/ja
Publication of JPS5512732B2 publication Critical patent/JPS5512732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP4850776A 1976-04-22 1976-04-30 Vapor-phase growth method of thin film Granted JPS52132675A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP4850776A JPS52132675A (en) 1976-04-30 1976-04-30 Vapor-phase growth method of thin film
US05/787,495 US4179326A (en) 1976-04-22 1977-04-14 Process for the vapor growth of a thin film
SE7704276A SE432162B (sv) 1976-04-22 1977-04-14 Forfarande for att utifran en anga bringa en tunn film att tillvexa
GB16011/77A GB1575578A (en) 1976-04-22 1977-04-18 Process for the vapour deposition of a thin film
IT22668/77A IT1114781B (it) 1976-04-22 1977-04-20 Processo per l'accresciemento,da fase vapore,di una sottile pellicola
FR7712288A FR2348983A1 (fr) 1976-04-22 1977-04-22 Procede de depot d'une couche mince sous forme vapeur
DE2718026A DE2718026C3 (de) 1976-04-22 1977-04-22 Verfahren zum Beschichten von Halbleiterplättchen aus der Dampfphase und deren Anwendung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4850776A JPS52132675A (en) 1976-04-30 1976-04-30 Vapor-phase growth method of thin film

Publications (2)

Publication Number Publication Date
JPS52132675A JPS52132675A (en) 1977-11-07
JPS5512732B2 true JPS5512732B2 (enExample) 1980-04-03

Family

ID=12805278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4850776A Granted JPS52132675A (en) 1976-04-22 1976-04-30 Vapor-phase growth method of thin film

Country Status (1)

Country Link
JP (1) JPS52132675A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986006416A1 (en) * 1985-05-02 1986-11-06 Hewlett-Packard Company Method and target for sputter depositing thin films

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035536U (ja) * 1983-08-18 1985-03-11 九州日本電気株式会社 減圧式気相成長装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986006416A1 (en) * 1985-05-02 1986-11-06 Hewlett-Packard Company Method and target for sputter depositing thin films

Also Published As

Publication number Publication date
JPS52132675A (en) 1977-11-07

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