JPS55108656A - Resin composition for thermosetting type resist film - Google Patents

Resin composition for thermosetting type resist film

Info

Publication number
JPS55108656A
JPS55108656A JP1516479A JP1516479A JPS55108656A JP S55108656 A JPS55108656 A JP S55108656A JP 1516479 A JP1516479 A JP 1516479A JP 1516479 A JP1516479 A JP 1516479A JP S55108656 A JPS55108656 A JP S55108656A
Authority
JP
Japan
Prior art keywords
acid
resin composition
methacrylic
average
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1516479A
Other languages
Japanese (ja)
Inventor
Jun Nakauchi
Toshio Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP1516479A priority Critical patent/JPS55108656A/en
Publication of JPS55108656A publication Critical patent/JPS55108656A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain the title resin composition having sufficient resolving power and high sensitivity by blending a specified methacrylic polymer and an aliphatic dicarboxylic acid.
CONSTITUTION: An aliphatic dicarboxylic acid such as methacrylic acid dimer or 1,2-ethanedicarboxylic acid represented by formula V or VI (where n is 1W12) is blended into a methacrylic copolymer containing methyl methacrylate and methacrylic acid ester, in a molar ratio of about 1:0.05W0.2, having a hydroxyl group at its side chain and represented by formula I (where n is 2W5) or formula II, III or IV (where n is 2W4). The blending ratio of the acid to the ester in the copolymer is about 0.4W0.6 by mol. The copolymer preferably has a no. average MW (Mn) of about 4000W100000 and a wt. average MW to no. average MW ratio (Mw/Mn) of about 3 or less.
COPYRIGHT: (C)1980,JPO&Japio
JP1516479A 1979-02-13 1979-02-13 Resin composition for thermosetting type resist film Pending JPS55108656A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1516479A JPS55108656A (en) 1979-02-13 1979-02-13 Resin composition for thermosetting type resist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1516479A JPS55108656A (en) 1979-02-13 1979-02-13 Resin composition for thermosetting type resist film

Publications (1)

Publication Number Publication Date
JPS55108656A true JPS55108656A (en) 1980-08-21

Family

ID=11881153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1516479A Pending JPS55108656A (en) 1979-02-13 1979-02-13 Resin composition for thermosetting type resist film

Country Status (1)

Country Link
JP (1) JPS55108656A (en)

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