JPS55108655A - Resin composition for resist - Google Patents

Resin composition for resist

Info

Publication number
JPS55108655A
JPS55108655A JP1591679A JP1591679A JPS55108655A JP S55108655 A JPS55108655 A JP S55108655A JP 1591679 A JP1591679 A JP 1591679A JP 1591679 A JP1591679 A JP 1591679A JP S55108655 A JPS55108655 A JP S55108655A
Authority
JP
Japan
Prior art keywords
formula
acid
methacrylic
average
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1591679A
Other languages
Japanese (ja)
Inventor
Jun Nakauchi
Toshio Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP1591679A priority Critical patent/JPS55108655A/en
Publication of JPS55108655A publication Critical patent/JPS55108655A/en
Pending legal-status Critical Current

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  • Epoxy Resins (AREA)

Abstract

PURPOSE: To obtain a resin composition having sufficient resolving power and high sensitivity by blending a specified methacrylic polymer and an aliphatic dicarboxylic acid.
CONSTITUTION: An aliphatic dicarboxylic acid such as methacrylic acid dimer or 1,2-ethanedicarboxylic acid represented by formula IV or V (where n is 1W12) is blended into a methacrylic copolymer containing methyl methacrylate and methacrylic acid ester, in a molar ratio of about 1:0.05W0.2, having an epoxy group at its side chain and represented by formula I (where n is 1W4), formula II (where n is 2W4) or formula III (where n is 1W4). The blending ratio of the acid to the ester in the copolymer is about 0.4W0.6 by mol. The copolymer preferably has a no. average MW (Mn) of about 4000W100000 and a wt. average MW to no. average MW ratio (Mw/Mn) of about 3 or less.
COPYRIGHT: (C)1980,JPO&Japio
JP1591679A 1979-02-14 1979-02-14 Resin composition for resist Pending JPS55108655A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1591679A JPS55108655A (en) 1979-02-14 1979-02-14 Resin composition for resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1591679A JPS55108655A (en) 1979-02-14 1979-02-14 Resin composition for resist

Publications (1)

Publication Number Publication Date
JPS55108655A true JPS55108655A (en) 1980-08-21

Family

ID=11902093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1591679A Pending JPS55108655A (en) 1979-02-14 1979-02-14 Resin composition for resist

Country Status (1)

Country Link
JP (1) JPS55108655A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003251808A (en) * 2001-12-28 2003-09-09 Canon Inc Channel constituting member of inkjet recording head and manufacturing method for inkjet recording head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003251808A (en) * 2001-12-28 2003-09-09 Canon Inc Channel constituting member of inkjet recording head and manufacturing method for inkjet recording head

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