JPS5489949A - Method of making antiicorrosive positive mask - Google Patents

Method of making antiicorrosive positive mask

Info

Publication number
JPS5489949A
JPS5489949A JP15502678A JP15502678A JPS5489949A JP S5489949 A JPS5489949 A JP S5489949A JP 15502678 A JP15502678 A JP 15502678A JP 15502678 A JP15502678 A JP 15502678A JP S5489949 A JPS5489949 A JP S5489949A
Authority
JP
Japan
Prior art keywords
antiicorrosive
making
positive mask
mask
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15502678A
Other languages
English (en)
Japanese (ja)
Inventor
Heruzeneru Yurugen
Buiruherumu Arufureeto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Licentia Patent Verwaltungs GmbH
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Publication of JPS5489949A publication Critical patent/JPS5489949A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
JP15502678A 1977-12-24 1978-12-18 Method of making antiicorrosive positive mask Pending JPS5489949A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772757931 DE2757931A1 (de) 1977-12-24 1977-12-24 Verfahren zum herstellen von positiven aetzresistenten masken

Publications (1)

Publication Number Publication Date
JPS5489949A true JPS5489949A (en) 1979-07-17

Family

ID=6027223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15502678A Pending JPS5489949A (en) 1977-12-24 1978-12-18 Method of making antiicorrosive positive mask

Country Status (2)

Country Link
JP (1) JPS5489949A (enrdf_load_stackoverflow)
DE (1) DE2757931A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5695659A (en) * 1995-11-27 1997-12-09 United Technologies Corporation Process for removing a protective coating from a surface of an airfoil

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
GB1445345A (en) * 1972-12-21 1976-08-11 Mullard Ltd Positive-working electron resists
GB1500541A (en) * 1975-03-20 1978-02-08 Mullard Ltd Method of producing positive-working electron resist coatings
US4004043A (en) * 1975-09-26 1977-01-18 International Business Machines Corporation Nitrated polymers as positive resists

Also Published As

Publication number Publication date
DE2757931A1 (de) 1979-07-12
DE2757931C2 (enrdf_load_stackoverflow) 1989-09-21

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