JPS5470239A - Bissazideephthalic acid derivative and its manufacture - Google Patents

Bissazideephthalic acid derivative and its manufacture

Info

Publication number
JPS5470239A
JPS5470239A JP12676478A JP12676478A JPS5470239A JP S5470239 A JPS5470239 A JP S5470239A JP 12676478 A JP12676478 A JP 12676478A JP 12676478 A JP12676478 A JP 12676478A JP S5470239 A JPS5470239 A JP S5470239A
Authority
JP
Japan
Prior art keywords
bissazideephthalic
manufacture
acid derivative
derivative
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12676478A
Other languages
English (en)
Inventor
Kibiita Furachisurafu
Tsubaifueru Hansu
Gureberu Geruto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS5470239A publication Critical patent/JPS5470239A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/44—Iso-indoles; Hydrogenated iso-indoles
    • C07D209/48—Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Indole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP12676478A 1977-10-14 1978-10-14 Bissazideephthalic acid derivative and its manufacture Pending JPS5470239A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1257977 1977-10-14

Publications (1)

Publication Number Publication Date
JPS5470239A true JPS5470239A (en) 1979-06-05

Family

ID=4384365

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12676478A Pending JPS5470239A (en) 1977-10-14 1978-10-14 Bissazideephthalic acid derivative and its manufacture

Country Status (5)

Country Link
EP (1) EP0002182B1 (ja)
JP (1) JPS5470239A (ja)
CA (1) CA1112246A (ja)
DE (1) DE2860609D1 (ja)
ES (1) ES474175A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4615968A (en) * 1982-11-04 1986-10-07 Ciba-Geigy Corporation Compositions of matter which crosslink under the action of light in the presence of sensitizers
EP0113313B1 (de) * 1982-11-04 1987-07-15 Ciba-Geigy Ag In Gegenwart von Sensibilisatoren unter Lichteinwirkung vernetzbare Stoffgemische und deren Verwendung
JPS62127735A (ja) * 1985-11-29 1987-06-10 Toshiba Corp 感光性樹脂組成物及びこれを用いたカラ−フイルタ−の製造方法
EP0353666A3 (en) * 1988-08-03 1990-05-23 Toyo Gosei Kogyo Co., Ltd. Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition
JPH04182466A (ja) * 1990-11-19 1992-06-30 Mitsubishi Gas Chem Co Inc ビストリメリティックイミド類の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
DE2000623C3 (de) * 1970-01-08 1979-06-28 Agfa-Gevaert Ag, 5090 Leverkusen Photographisches Verfahren zur Herstellung von Bildern

Also Published As

Publication number Publication date
CA1112246A (en) 1981-11-10
ES474175A1 (es) 1979-09-01
EP0002182A2 (de) 1979-06-13
EP0002182B1 (de) 1981-04-08
DE2860609D1 (en) 1981-04-30
EP0002182A3 (en) 1979-07-11

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