JPS546476B2 - - Google Patents

Info

Publication number
JPS546476B2
JPS546476B2 JP2591776A JP2591776A JPS546476B2 JP S546476 B2 JPS546476 B2 JP S546476B2 JP 2591776 A JP2591776 A JP 2591776A JP 2591776 A JP2591776 A JP 2591776A JP S546476 B2 JPS546476 B2 JP S546476B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2591776A
Other languages
Japanese (ja)
Other versions
JPS52109373A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2591776A priority Critical patent/JPS52109373A/ja
Publication of JPS52109373A publication Critical patent/JPS52109373A/ja
Publication of JPS546476B2 publication Critical patent/JPS546476B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP2591776A 1976-03-10 1976-03-10 Method of deflecting and scanning electron beam Granted JPS52109373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2591776A JPS52109373A (en) 1976-03-10 1976-03-10 Method of deflecting and scanning electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2591776A JPS52109373A (en) 1976-03-10 1976-03-10 Method of deflecting and scanning electron beam

Publications (2)

Publication Number Publication Date
JPS52109373A JPS52109373A (en) 1977-09-13
JPS546476B2 true JPS546476B2 (de) 1979-03-28

Family

ID=12179118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2591776A Granted JPS52109373A (en) 1976-03-10 1976-03-10 Method of deflecting and scanning electron beam

Country Status (1)

Country Link
JP (1) JPS52109373A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54137977A (en) * 1978-04-19 1979-10-26 Hitachi Ltd Electron-beam exposure unit
US4430571A (en) * 1981-04-16 1984-02-07 Control Data Corporation Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system
US4390789A (en) * 1981-05-21 1983-06-28 Control Data Corporation Electron beam array lithography system employing multiple parallel array optics channels and method of operation
JPS61192444U (de) * 1986-05-01 1986-11-29

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DENSHI TOKYO=1975 *

Also Published As

Publication number Publication date
JPS52109373A (en) 1977-09-13

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