JPS5461488A - Method of fabricating semiconductor - Google Patents
Method of fabricating semiconductorInfo
- Publication number
- JPS5461488A JPS5461488A JP12754477A JP12754477A JPS5461488A JP S5461488 A JPS5461488 A JP S5461488A JP 12754477 A JP12754477 A JP 12754477A JP 12754477 A JP12754477 A JP 12754477A JP S5461488 A JPS5461488 A JP S5461488A
- Authority
- JP
- Japan
- Prior art keywords
- fabricating semiconductor
- fabricating
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12754477A JPS5461488A (en) | 1977-10-26 | 1977-10-26 | Method of fabricating semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12754477A JPS5461488A (en) | 1977-10-26 | 1977-10-26 | Method of fabricating semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5461488A true JPS5461488A (en) | 1979-05-17 |
Family
ID=14962623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12754477A Pending JPS5461488A (en) | 1977-10-26 | 1977-10-26 | Method of fabricating semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5461488A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56108264A (en) * | 1980-01-31 | 1981-08-27 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of semiconductor device |
JPS61123152A (en) * | 1984-08-20 | 1986-06-11 | テキサス インスツルメンツ インコ−ポレイテツド | Separation of semiconductor device |
WO2000075981A1 (en) * | 1999-06-03 | 2000-12-14 | Asahi Kasei Microsystems Co., Ltd. | Method for manufacturing semiconductor device |
-
1977
- 1977-10-26 JP JP12754477A patent/JPS5461488A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56108264A (en) * | 1980-01-31 | 1981-08-27 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of semiconductor device |
JPS61123152A (en) * | 1984-08-20 | 1986-06-11 | テキサス インスツルメンツ インコ−ポレイテツド | Separation of semiconductor device |
WO2000075981A1 (en) * | 1999-06-03 | 2000-12-14 | Asahi Kasei Microsystems Co., Ltd. | Method for manufacturing semiconductor device |
US6387741B1 (en) | 1999-06-03 | 2002-05-14 | Asahi Kasei Microsystems Co., Ltd. | Manufacturing a semiconductor device with isolated circuit-element formation layers of different thicknesses |
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