JPS5456689A - Radiation-sensitive composition - Google Patents
Radiation-sensitive compositionInfo
- Publication number
- JPS5456689A JPS5456689A JP12277277A JP12277277A JPS5456689A JP S5456689 A JPS5456689 A JP S5456689A JP 12277277 A JP12277277 A JP 12277277A JP 12277277 A JP12277277 A JP 12277277A JP S5456689 A JPS5456689 A JP S5456689A
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- resist material
- sensitive composition
- reaction inhibitor
- acid monoester
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title abstract 4
- 125000003700 epoxy group Chemical group 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000002683 reaction inhibitor Substances 0.000 abstract 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 abstract 1
- -1 diphenylpicrylhydroxyl Chemical group 0.000 abstract 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 abstract 1
- 239000011976 maleic acid Substances 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- JFHBKKGEVRVZPE-UHFFFAOYSA-N oxiran-2-ylmethyl 4-ethenylbenzoate Chemical compound C1=CC(C=C)=CC=C1C(=O)OCC1OC1 JFHBKKGEVRVZPE-UHFFFAOYSA-N 0.000 abstract 1
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 abstract 1
- 238000003847 radiation curing Methods 0.000 abstract 1
- 239000002516 radical scavenger Substances 0.000 abstract 1
- 238000007142 ring opening reaction Methods 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 abstract 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 abstract 1
- 230000004304 visual acuity Effects 0.000 abstract 1
Landscapes
- Macromonomer-Based Addition Polymer (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Polymerisation Methods In General (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12277277A JPS5456689A (en) | 1977-10-12 | 1977-10-12 | Radiation-sensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12277277A JPS5456689A (en) | 1977-10-12 | 1977-10-12 | Radiation-sensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5456689A true JPS5456689A (en) | 1979-05-07 |
JPS6142250B2 JPS6142250B2 (enrdf_load_stackoverflow) | 1986-09-19 |
Family
ID=14844222
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12277277A Granted JPS5456689A (en) | 1977-10-12 | 1977-10-12 | Radiation-sensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5456689A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
-
1977
- 1977-10-12 JP JP12277277A patent/JPS5456689A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
Also Published As
Publication number | Publication date |
---|---|
JPS6142250B2 (enrdf_load_stackoverflow) | 1986-09-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5378298A (en) | Preparation of curable resin | |
JPS5392888A (en) | High solids resin composition | |
JPS5363310A (en) | Preparation of monomer composition containing pb and preparation of polymerhaving radiation shielding ability | |
JPS5456689A (en) | Radiation-sensitive composition | |
JPS51125475A (en) | Photo-polymerizable compositions | |
JPS5374533A (en) | Actinic radiation-curable temporary corrosion-resistant coating composition removable by alkali treatment | |
JPS51125200A (en) | Curable resin composition | |
JPS51133227A (en) | Preparation of 2-hydroxyalkyl (meth)acrylate | |
JPS546029A (en) | Anaerobic adhesive composition | |
JPS5421427A (en) | Unsaturated polyester varinish composition with low odor | |
JPS5584307A (en) | Preparation of curing composition | |
JPS51125182A (en) | Curable resin compositions | |
JPS5263985A (en) | Curable unsaturated epoxy resin composition | |
JPS5221035A (en) | Electron radiation curing coating composition | |
JPS55108412A (en) | Photocurable composition | |
JPS528043A (en) | Adhesive | |
JPS5283062A (en) | Photoetching method | |
JPS5282896A (en) | Fire-resistant mixture | |
JPS55164611A (en) | Resin composition for dental use | |
JPS51142028A (en) | Thermosetting type water-soluble coating composition | |
JPS51142492A (en) | Hardening accelerator | |
JPS55149313A (en) | High-energy ray-curable resin composition | |
JPS51131491A (en) | Method for reproduction of active carbon | |
JPS5219601A (en) | Apparatus for continuous esterification | |
JPS53147792A (en) | Modification of copolymer |