JPS545265B2 - - Google Patents

Info

Publication number
JPS545265B2
JPS545265B2 JP15090076A JP15090076A JPS545265B2 JP S545265 B2 JPS545265 B2 JP S545265B2 JP 15090076 A JP15090076 A JP 15090076A JP 15090076 A JP15090076 A JP 15090076A JP S545265 B2 JPS545265 B2 JP S545265B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15090076A
Other languages
Japanese (ja)
Other versions
JPS5375770A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15090076A priority Critical patent/JPS5375770A/ja
Publication of JPS5375770A publication Critical patent/JPS5375770A/ja
Publication of JPS545265B2 publication Critical patent/JPS545265B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15090076A 1976-12-17 1976-12-17 X-ray copying mask Granted JPS5375770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15090076A JPS5375770A (en) 1976-12-17 1976-12-17 X-ray copying mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15090076A JPS5375770A (en) 1976-12-17 1976-12-17 X-ray copying mask

Publications (2)

Publication Number Publication Date
JPS5375770A JPS5375770A (en) 1978-07-05
JPS545265B2 true JPS545265B2 (enrdf_load_stackoverflow) 1979-03-15

Family

ID=15506826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15090076A Granted JPS5375770A (en) 1976-12-17 1976-12-17 X-ray copying mask

Country Status (1)

Country Link
JP (1) JPS5375770A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56132343A (en) * 1980-03-22 1981-10-16 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask for x-ray exposure and its manufacture
JPS58207635A (ja) * 1982-05-28 1983-12-03 Seiko Epson Corp メンブラン・マスクの製造方法
US4708919A (en) * 1985-08-02 1987-11-24 Micronix Corporation Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3742230A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask support substrate
US3892973A (en) * 1974-02-15 1975-07-01 Bell Telephone Labor Inc Mask structure for X-ray lithography

Also Published As

Publication number Publication date
JPS5375770A (en) 1978-07-05

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