JPS544712B2 - - Google Patents
Info
- Publication number
- JPS544712B2 JPS544712B2 JP4492376A JP4492376A JPS544712B2 JP S544712 B2 JPS544712 B2 JP S544712B2 JP 4492376 A JP4492376 A JP 4492376A JP 4492376 A JP4492376 A JP 4492376A JP S544712 B2 JPS544712 B2 JP S544712B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4492376A JPS52128890A (en) | 1976-04-22 | 1976-04-22 | Production of thin film by decompression gas phase growth process |
SE7704276A SE432162B (sv) | 1976-04-22 | 1977-04-14 | Forfarande for att utifran en anga bringa en tunn film att tillvexa |
US05/787,495 US4179326A (en) | 1976-04-22 | 1977-04-14 | Process for the vapor growth of a thin film |
GB16011/77A GB1575578A (en) | 1976-04-22 | 1977-04-18 | Process for the vapour deposition of a thin film |
IT22668/77A IT1114781B (it) | 1976-04-22 | 1977-04-20 | Processo per l'accresciemento,da fase vapore,di una sottile pellicola |
FR7712288A FR2348983A1 (fr) | 1976-04-22 | 1977-04-22 | Procede de depot d'une couche mince sous forme vapeur |
DE2718026A DE2718026C3 (de) | 1976-04-22 | 1977-04-22 | Verfahren zum Beschichten von Halbleiterplättchen aus der Dampfphase und deren Anwendung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4492376A JPS52128890A (en) | 1976-04-22 | 1976-04-22 | Production of thin film by decompression gas phase growth process |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52128890A JPS52128890A (en) | 1977-10-28 |
JPS544712B2 true JPS544712B2 (sk) | 1979-03-09 |
Family
ID=12704980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4492376A Granted JPS52128890A (en) | 1976-04-22 | 1976-04-22 | Production of thin film by decompression gas phase growth process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52128890A (sk) |
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1976
- 1976-04-22 JP JP4492376A patent/JPS52128890A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS52128890A (en) | 1977-10-28 |