JPS5442717B2 - - Google Patents
Info
- Publication number
- JPS5442717B2 JPS5442717B2 JP1918976A JP1918976A JPS5442717B2 JP S5442717 B2 JPS5442717 B2 JP S5442717B2 JP 1918976 A JP1918976 A JP 1918976A JP 1918976 A JP1918976 A JP 1918976A JP S5442717 B2 JPS5442717 B2 JP S5442717B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1918976A JPS52103097A (en) | 1976-02-24 | 1976-02-24 | Reciprocating machine tools provided with oscillating movement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1918976A JPS52103097A (en) | 1976-02-24 | 1976-02-24 | Reciprocating machine tools provided with oscillating movement |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52103097A JPS52103097A (en) | 1977-08-29 |
JPS5442717B2 true JPS5442717B2 (de) | 1979-12-15 |
Family
ID=11992379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1918976A Granted JPS52103097A (en) | 1976-02-24 | 1976-02-24 | Reciprocating machine tools provided with oscillating movement |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52103097A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0133649Y2 (de) * | 1983-09-30 | 1989-10-12 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5210069A (en) * | 1975-07-14 | 1977-01-26 | Seiko Epson Corp | Automatic apparatus for cleaning and drying wafer |
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1976
- 1976-02-24 JP JP1918976A patent/JPS52103097A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5210069A (en) * | 1975-07-14 | 1977-01-26 | Seiko Epson Corp | Automatic apparatus for cleaning and drying wafer |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0133649Y2 (de) * | 1983-09-30 | 1989-10-12 |
Also Published As
Publication number | Publication date |
---|---|
JPS52103097A (en) | 1977-08-29 |