JPS544255B2 - - Google Patents
Info
- Publication number
- JPS544255B2 JPS544255B2 JP12849776A JP12849776A JPS544255B2 JP S544255 B2 JPS544255 B2 JP S544255B2 JP 12849776 A JP12849776 A JP 12849776A JP 12849776 A JP12849776 A JP 12849776A JP S544255 B2 JPS544255 B2 JP S544255B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12849776A JPS5353314A (en) | 1976-10-26 | 1976-10-26 | Sensitive high polymer composition and picture imae forming method usingsaid composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12849776A JPS5353314A (en) | 1976-10-26 | 1976-10-26 | Sensitive high polymer composition and picture imae forming method usingsaid composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5353314A JPS5353314A (en) | 1978-05-15 |
| JPS544255B2 true JPS544255B2 (OSRAM) | 1979-03-05 |
Family
ID=14986195
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12849776A Granted JPS5353314A (en) | 1976-10-26 | 1976-10-26 | Sensitive high polymer composition and picture imae forming method usingsaid composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5353314A (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
| JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
| JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
| JP4434762B2 (ja) | 2003-01-31 | 2010-03-17 | 東京応化工業株式会社 | レジスト組成物 |
-
1976
- 1976-10-26 JP JP12849776A patent/JPS5353314A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5353314A (en) | 1978-05-15 |