JPS5440888A - Photosensitive resin composition having good storage stability - Google Patents
Photosensitive resin composition having good storage stabilityInfo
- Publication number
- JPS5440888A JPS5440888A JP10725977A JP10725977A JPS5440888A JP S5440888 A JPS5440888 A JP S5440888A JP 10725977 A JP10725977 A JP 10725977A JP 10725977 A JP10725977 A JP 10725977A JP S5440888 A JPS5440888 A JP S5440888A
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl
- resin composition
- photosensitive resin
- storage stability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10725977A JPS6053041B2 (ja) | 1977-09-08 | 1977-09-08 | 貯蔵安定性の良好な感光性樹脂組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10725977A JPS6053041B2 (ja) | 1977-09-08 | 1977-09-08 | 貯蔵安定性の良好な感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5440888A true JPS5440888A (en) | 1979-03-31 |
JPS6053041B2 JPS6053041B2 (ja) | 1985-11-22 |
Family
ID=14454506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10725977A Expired JPS6053041B2 (ja) | 1977-09-08 | 1977-09-08 | 貯蔵安定性の良好な感光性樹脂組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6053041B2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5784682A (en) * | 1980-10-02 | 1982-05-27 | Sperry Rand Corp | Cathode ray tube electron beam deflection controller |
JPH0551403A (ja) * | 1990-11-09 | 1993-03-02 | Nippon Shokubai Co Ltd | ビニル化合物の重合防止剤および重合防止方法 |
JPH10274853A (ja) * | 1997-03-27 | 1998-10-13 | Tokyo Ohka Kogyo Co Ltd | パターン形成方法およびこれに用いるネガ型ホトレジスト組成物 |
JP2016042171A (ja) * | 2014-08-19 | 2016-03-31 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6399254U (ja) * | 1986-12-19 | 1988-06-27 |
-
1977
- 1977-09-08 JP JP10725977A patent/JPS6053041B2/ja not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5784682A (en) * | 1980-10-02 | 1982-05-27 | Sperry Rand Corp | Cathode ray tube electron beam deflection controller |
JPH0551403A (ja) * | 1990-11-09 | 1993-03-02 | Nippon Shokubai Co Ltd | ビニル化合物の重合防止剤および重合防止方法 |
JPH10274853A (ja) * | 1997-03-27 | 1998-10-13 | Tokyo Ohka Kogyo Co Ltd | パターン形成方法およびこれに用いるネガ型ホトレジスト組成物 |
JP2016042171A (ja) * | 2014-08-19 | 2016-03-31 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6053041B2 (ja) | 1985-11-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5666841A (en) | Photographic material | |
JPS5440888A (en) | Photosensitive resin composition having good storage stability | |
KR840003070A (ko) | 감광성(感光性)의 수지조성물(樹脂組成物)과 이것을 사용하여 미세한 패터언(Pattern)을 형성하는 방법 | |
JPS5655942A (en) | Photographic material | |
JPS55133030A (en) | Photopolymerizable composition | |
JPS5540415A (en) | Photosensitive composition | |
JPS5614232A (en) | Negative type resist resin | |
JPS5347496A (en) | Active halogen atom-containing polyether and its preparation | |
JPS5312978A (en) | Isolation of low-molecular weight polymers | |
JPS5786830A (en) | Pattern forming material | |
JPS5540416A (en) | Photosensitive composition | |
JPS57171494A (en) | Scale inhibitor | |
JPS5762047A (en) | Image-forming material | |
JPS5662854A (en) | Resin composition for coating material | |
JPS5311927A (en) | Aqueous polymer emulsion composition for coating | |
JPS5599068A (en) | Filler for liquid chromatography | |
JPS5327688A (en) | Preparation of impact resistant, weather resistant graft copolymer | |
JPS5551050A (en) | Polymerizable aminosulfonic acid compound | |
JPS5477685A (en) | Photopolymerization initiator | |
JPS5669628A (en) | Developer composition for lithographic plate | |
JPS5414489A (en) | Photosensitizer | |
JPS55106276A (en) | Hardenable adhesive composition | |
JPS5765706A (en) | Production of latex polymer having good flocculation property | |
JPS5458792A (en) | Photo-sensitive resin composition | |
JPS5430163A (en) | 2-aminomethyl-5-phenyloxazoles and their pharmaceutically acceptable acid salts |