JPS5440392B2 - - Google Patents
Info
- Publication number
- JPS5440392B2 JPS5440392B2 JP8502176A JP8502176A JPS5440392B2 JP S5440392 B2 JPS5440392 B2 JP S5440392B2 JP 8502176 A JP8502176 A JP 8502176A JP 8502176 A JP8502176 A JP 8502176A JP S5440392 B2 JPS5440392 B2 JP S5440392B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8502176A JPS5311175A (en) | 1976-07-19 | 1976-07-19 | High frequency ion plating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8502176A JPS5311175A (en) | 1976-07-19 | 1976-07-19 | High frequency ion plating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5311175A JPS5311175A (en) | 1978-02-01 |
| JPS5440392B2 true JPS5440392B2 (pt) | 1979-12-03 |
Family
ID=13847065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8502176A Granted JPS5311175A (en) | 1976-07-19 | 1976-07-19 | High frequency ion plating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5311175A (pt) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63109162A (ja) * | 1986-10-24 | 1988-05-13 | Res Dev Corp Of Japan | イオンプレ−テイング方法とその装置 |
-
1976
- 1976-07-19 JP JP8502176A patent/JPS5311175A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5311175A (en) | 1978-02-01 |