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Priority to JP8502176ApriorityCriticalpatent/JPS5311175A/ja
Publication of JPS5311175ApublicationCriticalpatent/JPS5311175A/ja
Publication of JPS5440392B2publicationCriticalpatent/JPS5440392B2/ja
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C14/24—Vacuum evaporation
C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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Chemical & Material Sciences
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Chemical Kinetics & Catalysis
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Engineering & Computer Science
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Materials Engineering
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Mechanical Engineering
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Metallurgy
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Organic Chemistry
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Physical Vapour Deposition
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JP8502176A1976-07-191976-07-19High frequency ion plating apparatus
GrantedJPS5311175A
(en)