JPS5437492B1 - - Google Patents
Info
- Publication number
- JPS5437492B1 JPS5437492B1 JP3925571A JP3925571A JPS5437492B1 JP S5437492 B1 JPS5437492 B1 JP S5437492B1 JP 3925571 A JP3925571 A JP 3925571A JP 3925571 A JP3925571 A JP 3925571A JP S5437492 B1 JPS5437492 B1 JP S5437492B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Furan Compounds (AREA)
- Pyrane Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4378270A | 1970-06-05 | 1970-06-05 | |
| US10339271A | 1971-01-04 | 1971-01-04 | |
| US00103865A US3833614A (en) | 1970-06-05 | 1971-01-04 | Phthalides and naphthalides |
| US00103864A US3833615A (en) | 1970-06-05 | 1971-01-04 | Naphthalides and phthalides |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5437492B1 true JPS5437492B1 (enrdf_load_stackoverflow) | 1979-11-15 |
Family
ID=27488878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3925571A Pending JPS5437492B1 (enrdf_load_stackoverflow) | 1970-06-05 | 1971-06-04 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5437492B1 (enrdf_load_stackoverflow) |
| MX (1) | MX144572A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015137486A1 (ja) * | 2014-03-13 | 2015-09-17 | 三菱瓦斯化学株式会社 | 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法、及び化合物又は樹脂の精製方法 |
| US10303055B2 (en) | 2014-03-13 | 2019-05-28 | Mitsubishi Gas Chemical Company, Inc. | Resist composition and method for forming resist pattern |
| US10642156B2 (en) | 2015-03-30 | 2020-05-05 | Mitsubishi Gas Chemical Company, Inc. | Resist base material, resist composition and method for forming resist pattern |
| US10747112B2 (en) | 2015-03-30 | 2020-08-18 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method |
-
1971
- 1971-06-04 MX MX15202371A patent/MX144572A/es unknown
- 1971-06-04 JP JP3925571A patent/JPS5437492B1/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015137486A1 (ja) * | 2014-03-13 | 2015-09-17 | 三菱瓦斯化学株式会社 | 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法、及び化合物又は樹脂の精製方法 |
| JPWO2015137486A1 (ja) * | 2014-03-13 | 2017-04-06 | 三菱瓦斯化学株式会社 | 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法、及び化合物又は樹脂の精製方法 |
| US10294183B2 (en) | 2014-03-13 | 2019-05-21 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin |
| US10303055B2 (en) | 2014-03-13 | 2019-05-28 | Mitsubishi Gas Chemical Company, Inc. | Resist composition and method for forming resist pattern |
| US10642156B2 (en) | 2015-03-30 | 2020-05-05 | Mitsubishi Gas Chemical Company, Inc. | Resist base material, resist composition and method for forming resist pattern |
| US10747112B2 (en) | 2015-03-30 | 2020-08-18 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method |
Also Published As
| Publication number | Publication date |
|---|---|
| MX144572A (es) | 1981-10-28 |