JPS5429453B1 - - Google Patents
Info
- Publication number
- JPS5429453B1 JPS5429453B1 JP1717171A JP1717171A JPS5429453B1 JP S5429453 B1 JPS5429453 B1 JP S5429453B1 JP 1717171 A JP1717171 A JP 1717171A JP 1717171 A JP1717171 A JP 1717171A JP S5429453 B1 JPS5429453 B1 JP S5429453B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K15/00—Electron-beam welding or cutting
- B23K15/0013—Positioning or observing workpieces, e.g. with respect to the impact; Aligning, aiming or focusing electronbeams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2013950A DE2013950C3 (de) | 1970-03-24 | 1970-03-24 | Verfahren zum Verändern der Fokuslage längs der Strahlachse eines zum Schweißen dienenden Elektronenstrahls |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5429453B1 true JPS5429453B1 (enExample) | 1979-09-22 |
Family
ID=5766042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1717171A Pending JPS5429453B1 (enExample) | 1970-03-24 | 1971-03-24 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3752952A (enExample) |
| JP (1) | JPS5429453B1 (enExample) |
| FR (1) | FR2085049A5 (enExample) |
| GB (1) | GB1321358A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT363149B (de) * | 1976-07-30 | 1981-07-10 | Steigerwald Strahltech | Einrichtung zum nahtschweissen mittels eines energiestrahles |
| US4400609A (en) * | 1980-09-18 | 1983-08-23 | Pastushenko Jury I | Device for detecting seam between abutting workpieces by electron beam |
| GB8325290D0 (en) * | 1983-09-21 | 1983-10-26 | British Ship Research Assn | Welding/cutting |
| FR2559695B1 (fr) * | 1984-02-20 | 1995-04-21 | Mitsubishi Electric Corp | Procede et appareil pour detecter et reguler la position d'un faisceau electronique de soudage |
| ATE344115T1 (de) * | 2001-06-15 | 2006-11-15 | Josch Strahlschweisstechnik Gm | Grundkörper aus gefügten rohrstücken und verfahren zu seiner herstellung |
| DE10232230A1 (de) * | 2002-07-17 | 2004-02-05 | Pro-Beam Ag & Co. Kgaa | Verfahren zum Vermessen des Intensitätsprofils eines Elektronenstrahls, insbesondere eines Strahls eines Elektronenstrahlbearbeitungsgeräts, und/oder zum Vermessen einer Optik für einen Elektronenstrahl und/oder zum Justieren einer Optik für einen Elektronenstrahl, Meßstruktur für ein solches Verfahren und Elektronenstrahlbearbeitungsgerät |
| US8546717B2 (en) | 2009-09-17 | 2013-10-01 | Sciaky, Inc. | Electron beam layer manufacturing |
| AU2011233678B2 (en) | 2010-03-31 | 2015-01-22 | Sciaky, Inc. | Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL285495A (enExample) * | 1961-11-18 | |||
| US3329813A (en) * | 1964-08-25 | 1967-07-04 | Jeol Ltd | Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen |
-
1971
- 1971-03-23 US US00127331A patent/US3752952A/en not_active Expired - Lifetime
- 1971-03-23 FR FR7110249A patent/FR2085049A5/fr not_active Expired
- 1971-03-24 JP JP1717171A patent/JPS5429453B1/ja active Pending
- 1971-04-19 GB GB2474971*A patent/GB1321358A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3752952A (en) | 1973-08-14 |
| FR2085049A5 (enExample) | 1971-12-17 |
| GB1321358A (en) | 1973-06-27 |