JPS5429453B1 - - Google Patents

Info

Publication number
JPS5429453B1
JPS5429453B1 JP1717171A JP1717171A JPS5429453B1 JP S5429453 B1 JPS5429453 B1 JP S5429453B1 JP 1717171 A JP1717171 A JP 1717171A JP 1717171 A JP1717171 A JP 1717171A JP S5429453 B1 JPS5429453 B1 JP S5429453B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1717171A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2013950A external-priority patent/DE2013950C3/de
Application filed filed Critical
Publication of JPS5429453B1 publication Critical patent/JPS5429453B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K15/00Electron-beam welding or cutting
    • B23K15/0013Positioning or observing workpieces, e.g. with respect to the impact; Aligning, aiming or focusing electronbeams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/21Means for adjusting the focus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
JP1717171A 1970-03-24 1971-03-24 Pending JPS5429453B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2013950A DE2013950C3 (de) 1970-03-24 1970-03-24 Verfahren zum Verändern der Fokuslage längs der Strahlachse eines zum Schweißen dienenden Elektronenstrahls

Publications (1)

Publication Number Publication Date
JPS5429453B1 true JPS5429453B1 (ja) 1979-09-22

Family

ID=5766042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1717171A Pending JPS5429453B1 (ja) 1970-03-24 1971-03-24

Country Status (4)

Country Link
US (1) US3752952A (ja)
JP (1) JPS5429453B1 (ja)
FR (1) FR2085049A5 (ja)
GB (1) GB1321358A (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT363149B (de) * 1976-07-30 1981-07-10 Steigerwald Strahltech Einrichtung zum nahtschweissen mittels eines energiestrahles
US4400609A (en) * 1980-09-18 1983-08-23 Pastushenko Jury I Device for detecting seam between abutting workpieces by electron beam
GB8325290D0 (en) * 1983-09-21 1983-10-26 British Ship Research Assn Welding/cutting
FR2559695B1 (fr) * 1984-02-20 1995-04-21 Mitsubishi Electric Corp Procede et appareil pour detecter et reguler la position d'un faisceau electronique de soudage
DE50208575D1 (de) * 2001-06-15 2006-12-14 Josch Strahlschweistechnik Gmb Grundkörper aus gefügten Rohrstücken und Verfahren zu seiner Herstellung
DE10232230A1 (de) 2002-07-17 2004-02-05 Pro-Beam Ag & Co. Kgaa Verfahren zum Vermessen des Intensitätsprofils eines Elektronenstrahls, insbesondere eines Strahls eines Elektronenstrahlbearbeitungsgeräts, und/oder zum Vermessen einer Optik für einen Elektronenstrahl und/oder zum Justieren einer Optik für einen Elektronenstrahl, Meßstruktur für ein solches Verfahren und Elektronenstrahlbearbeitungsgerät
AU2010295585B2 (en) 2009-09-17 2015-10-08 Sciaky, Inc. Electron beam layer manufacturing
EP2555902B1 (en) 2010-03-31 2018-04-25 Sciaky Inc. Raster methodology for electron beam layer manufacturing using closed loop control

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL285495A (ja) * 1961-11-18
US3329813A (en) * 1964-08-25 1967-07-04 Jeol Ltd Backscatter electron analysis apparatus to determine elemental content or surface topography of a specimen

Also Published As

Publication number Publication date
GB1321358A (en) 1973-06-27
FR2085049A5 (ja) 1971-12-17
US3752952A (en) 1973-08-14

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