JPS5423574B2 - - Google Patents
Info
- Publication number
- JPS5423574B2 JPS5423574B2 JP9193672A JP9193672A JPS5423574B2 JP S5423574 B2 JPS5423574 B2 JP S5423574B2 JP 9193672 A JP9193672 A JP 9193672A JP 9193672 A JP9193672 A JP 9193672A JP S5423574 B2 JPS5423574 B2 JP S5423574B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9193672A JPS5423574B2 (me) | 1972-09-13 | 1972-09-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9193672A JPS5423574B2 (me) | 1972-09-13 | 1972-09-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4949703A JPS4949703A (me) | 1974-05-14 |
| JPS5423574B2 true JPS5423574B2 (me) | 1979-08-15 |
Family
ID=14040465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9193672A Expired JPS5423574B2 (me) | 1972-09-13 | 1972-09-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5423574B2 (me) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5136932A (ja) * | 1974-09-25 | 1976-03-29 | Unitika Ltd | Kankoseisoseibutsu |
| ATE85138T1 (de) * | 1985-02-19 | 1993-02-15 | Ucb Sa | Zusammensetzung und verfahren zur herstellung eines musters von klebemitteln. |
| CA1307695C (en) * | 1986-01-13 | 1992-09-22 | Wayne Edmund Feely | Photosensitive compounds and thermally stable and aqueous developablenegative images |
| DE3821584A1 (de) * | 1988-06-25 | 1989-12-28 | Hoechst Ag | Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung |
| JP2982266B2 (ja) * | 1990-09-28 | 1999-11-22 | 三菱化学株式会社 | ネガ型感光性組成物 |
| JPH04110945A (ja) * | 1990-08-31 | 1992-04-13 | Mitsubishi Kasei Corp | ネガ型感光性組成物 |
| JPH04215658A (ja) * | 1990-12-13 | 1992-08-06 | Nippon Kayaku Co Ltd | ネガ型感放射線性レジスト組成物 |
| US6794109B2 (en) | 2001-02-23 | 2004-09-21 | Massachusetts Institute Of Technology | Low abosorbing resists for 157 nm lithography |
| EP3715949A4 (en) * | 2017-11-20 | 2021-01-27 | Mitsubishi Gas Chemical Company, Inc. | COMPOSITION FOR FORMING A LITHOGRAPHIC FILM, LITHOGRAPHIC FILM, RESERVE PATTERN FORMING PROCESS AND CIRCUIT PATTERN FORMING PROCESS |
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1972
- 1972-09-13 JP JP9193672A patent/JPS5423574B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4949703A (me) | 1974-05-14 |