ATE85138T1 - Zusammensetzung und verfahren zur herstellung eines musters von klebemitteln. - Google Patents
Zusammensetzung und verfahren zur herstellung eines musters von klebemitteln.Info
- Publication number
- ATE85138T1 ATE85138T1 AT86870020T AT86870020T ATE85138T1 AT E85138 T1 ATE85138 T1 AT E85138T1 AT 86870020 T AT86870020 T AT 86870020T AT 86870020 T AT86870020 T AT 86870020T AT E85138 T1 ATE85138 T1 AT E85138T1
- Authority
- AT
- Austria
- Prior art keywords
- adhesive
- blend
- pattern
- resin
- resins
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0522—Using an adhesive pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70257385A | 1985-02-19 | 1985-02-19 | |
EP86870020A EP0195767B1 (de) | 1985-02-19 | 1986-02-18 | Zusammensetzung und Verfahren zur Herstellung eines Musters von Klebemitteln |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE85138T1 true ATE85138T1 (de) | 1993-02-15 |
Family
ID=24821782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT86870020T ATE85138T1 (de) | 1985-02-19 | 1986-02-18 | Zusammensetzung und verfahren zur herstellung eines musters von klebemitteln. |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0195767B1 (de) |
JP (1) | JPS61194441A (de) |
AT (1) | ATE85138T1 (de) |
DE (1) | DE3687585T2 (de) |
HK (1) | HK56194A (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2221469B (en) * | 1985-12-27 | 1990-09-05 | Fsk Kk | Adhesive sheet suitable for use in dicing semiconductor wafers into chips |
DE3639266A1 (de) * | 1985-12-27 | 1987-07-02 | Fsk K K | Haftfolie |
US5183599A (en) * | 1990-01-19 | 1993-02-02 | Smuckler Jack H | Rapid curing, electrically conductive adhesive |
KR20070105040A (ko) * | 2006-04-25 | 2007-10-30 | 엘지.필립스 엘시디 주식회사 | 레지스트 조성물, 이를 이용한 레지스트 패턴 형성방법 및이를 이용하여 제조된 어레이 기판 |
CN114907798B (zh) * | 2021-10-22 | 2024-05-28 | 亮线(上海)新材料科技有限公司 | 一种电子束辐射固化胶黏剂及其制备方法与应用 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5423574B2 (de) * | 1972-09-13 | 1979-08-15 | ||
JPS5515696B2 (de) * | 1973-08-07 | 1980-04-25 | ||
DE2854010A1 (de) * | 1977-12-21 | 1979-07-05 | Letraset International Ltd | Verfahren zur herstellung von schildern |
JPS55145717A (en) * | 1979-05-02 | 1980-11-13 | Sumitomo Chem Co Ltd | Resin composition curable by ultraviolet ray |
JPS5626951A (en) * | 1979-08-08 | 1981-03-16 | Mitsubishi Gas Chem Co Inc | Curable resin composition |
JPS5667322A (en) * | 1979-11-05 | 1981-06-06 | Showa Highpolymer Co Ltd | Curable resin composition |
EP0142463B1 (de) * | 1983-08-24 | 1989-09-20 | Ciba-Geigy Ag | Verfahren zur Herstellung von Prepregs und die damit erhältlichen verstärkten Verbundstoffe |
-
1986
- 1986-02-18 JP JP61033685A patent/JPS61194441A/ja active Pending
- 1986-02-18 AT AT86870020T patent/ATE85138T1/de not_active IP Right Cessation
- 1986-02-18 EP EP86870020A patent/EP0195767B1/de not_active Expired - Lifetime
- 1986-02-18 DE DE8686870020T patent/DE3687585T2/de not_active Expired - Fee Related
-
1994
- 1994-05-24 HK HK56194A patent/HK56194A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
HK56194A (en) | 1994-06-03 |
EP0195767A1 (de) | 1986-09-24 |
EP0195767B1 (de) | 1993-01-27 |
DE3687585T2 (de) | 1993-06-09 |
JPS61194441A (ja) | 1986-08-28 |
DE3687585D1 (de) | 1993-03-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
REN | Ceased due to non-payment of the annual fee |