JPS5423039A - Vapor phase plating process - Google Patents
Vapor phase plating processInfo
- Publication number
- JPS5423039A JPS5423039A JP8791377A JP8791377A JPS5423039A JP S5423039 A JPS5423039 A JP S5423039A JP 8791377 A JP8791377 A JP 8791377A JP 8791377 A JP8791377 A JP 8791377A JP S5423039 A JPS5423039 A JP S5423039A
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- plating process
- phase plating
- supplyign
- reactorqarranging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To efficiently form plate films of a uniform thickenss by providing a heating element in the center of a reactorqarranging mateirals to be plated inthe optimal reaction region of the reactor; and supplyign a vapor source to the periphery.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8791377A JPS6011104B2 (en) | 1977-07-22 | 1977-07-22 | Gas phase plating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8791377A JPS6011104B2 (en) | 1977-07-22 | 1977-07-22 | Gas phase plating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5423039A true JPS5423039A (en) | 1979-02-21 |
JPS6011104B2 JPS6011104B2 (en) | 1985-03-23 |
Family
ID=13928149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8791377A Expired JPS6011104B2 (en) | 1977-07-22 | 1977-07-22 | Gas phase plating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6011104B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996033295A1 (en) * | 1995-04-18 | 1996-10-24 | Societe Europeenne De Propulsion | Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks |
-
1977
- 1977-07-22 JP JP8791377A patent/JPS6011104B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996033295A1 (en) * | 1995-04-18 | 1996-10-24 | Societe Europeenne De Propulsion | Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks |
FR2733254A1 (en) * | 1995-04-18 | 1996-10-25 | Europ Propulsion | CHEMICAL VAPOR INFILTRATION PROCESS FOR THE DENSIFICATION OF POROUS SUBSTRATES DISPOSED IN RING STACKS |
US5904957A (en) * | 1995-04-18 | 1999-05-18 | Societe Europeenne De Propulsion | Vapour phase chemical infiltration process for densifying porous substrates disposed in annular stacks |
Also Published As
Publication number | Publication date |
---|---|
JPS6011104B2 (en) | 1985-03-23 |
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