JPS54149420A - Image pickup system - Google Patents

Image pickup system

Info

Publication number
JPS54149420A
JPS54149420A JP5797478A JP5797478A JPS54149420A JP S54149420 A JPS54149420 A JP S54149420A JP 5797478 A JP5797478 A JP 5797478A JP 5797478 A JP5797478 A JP 5797478A JP S54149420 A JPS54149420 A JP S54149420A
Authority
JP
Japan
Prior art keywords
speed
pulse motor
shutter
image pickup
pickup unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5797478A
Other languages
Japanese (ja)
Other versions
JPS607870B2 (en
Inventor
Yutaka Yunoki
Ryoichi Tozono
Masahiro Kishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP53057974A priority Critical patent/JPS607870B2/en
Publication of JPS54149420A publication Critical patent/JPS54149420A/en
Publication of JPS607870B2 publication Critical patent/JPS607870B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Shutters For Cameras (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Control Of Stepping Motors (AREA)

Abstract

PURPOSE:To obtain an image pickup unit by which a shutter operation having enough durability to be used practically and a high-speed and equal-speed property is made possible and an accurate exposure can be completed in the vertical blanking time of the image pickup unit. CONSTITUTION:The shutter of a two-dimensional pickup unit is constituted by the light flux switching material having optical aperture part 31 and light shielding part 32, pulse motor 1 to rotate this material to cause the shutter operation, and shutter control and driving circuits 115 and 116. These control and driving circuits 115 and 116 output driving pulses of a frequency, which is so set that pulse motor 1 can rotate at a high speed and an equal angle speed in a prescribed step just after the driving determined by the inertial load of the light flux switching material, etc., to pulse motor 1 and drive it, and the shutter operation is performed during the high- speed and equal angle-speed rotation period of the driven pulse motor.
JP53057974A 1978-05-16 1978-05-16 Imaging method Expired JPS607870B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53057974A JPS607870B2 (en) 1978-05-16 1978-05-16 Imaging method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53057974A JPS607870B2 (en) 1978-05-16 1978-05-16 Imaging method

Publications (2)

Publication Number Publication Date
JPS54149420A true JPS54149420A (en) 1979-11-22
JPS607870B2 JPS607870B2 (en) 1985-02-27

Family

ID=13070973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53057974A Expired JPS607870B2 (en) 1978-05-16 1978-05-16 Imaging method

Country Status (1)

Country Link
JP (1) JPS607870B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180124968A (en) * 2016-03-31 2018-11-21 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 A shutter device used for exposure in a lithography machine and a method for its use

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180124968A (en) * 2016-03-31 2018-11-21 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 A shutter device used for exposure in a lithography machine and a method for its use
JP2019516125A (en) * 2016-03-31 2019-06-13 シャンハイ マイクロ エレクトロニクス イクイプメント(グループ)カンパニー リミティド Shutter device for use in lithography machine exposure and method of using the same
US10712668B2 (en) 2016-03-31 2020-07-14 Shanghai Micro Electronics Equipment (Group) Co., Ltd. Shutter device used for exposure in lithography machine, and method for use thereof

Also Published As

Publication number Publication date
JPS607870B2 (en) 1985-02-27

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