JPS54125981A - Semiconductor washing device - Google Patents
Semiconductor washing deviceInfo
- Publication number
- JPS54125981A JPS54125981A JP3372478A JP3372478A JPS54125981A JP S54125981 A JPS54125981 A JP S54125981A JP 3372478 A JP3372478 A JP 3372478A JP 3372478 A JP3372478 A JP 3372478A JP S54125981 A JPS54125981 A JP S54125981A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- uniform
- right above
- short time
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To secure the uniform washing for the whole of the semiconductor substrate with the minimum amount of the cleansing solution and in a short time by varying the nozzle shifting speed.
CONSTITUTION: Nozzle 8 attached to arm 7 features a reciprocal motion being accelerated when moving close to the turning center of substrate 4 and then retarded when moving away from the center respectively through motor driving 5 via non- stepped change gear 9. In the actual application, the nozzle shifting speed right above the turning center is set 3W4 times as high as that right above the utmost outer circumferece. As a reslut, the amount of the solution received at the unit time is almost uniform at each part on the substrate surface, thus ensuring the uniform washing effect in a short time.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3372478A JPS54125981A (en) | 1978-03-23 | 1978-03-23 | Semiconductor washing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3372478A JPS54125981A (en) | 1978-03-23 | 1978-03-23 | Semiconductor washing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54125981A true JPS54125981A (en) | 1979-09-29 |
Family
ID=12394338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3372478A Pending JPS54125981A (en) | 1978-03-23 | 1978-03-23 | Semiconductor washing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54125981A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5790941A (en) * | 1980-11-27 | 1982-06-05 | Toshiba Corp | Swing type vertical washer |
JPS58122732A (en) * | 1982-01-14 | 1983-07-21 | Toshiba Corp | Wafer washing method |
JPS58200537A (en) * | 1982-05-18 | 1983-11-22 | Toshiba Corp | Applying method for resist |
JPS61131460A (en) * | 1984-11-30 | 1986-06-19 | Canon Inc | Wafer cleaning device |
JPS61178082A (en) * | 1985-02-05 | 1986-08-09 | 沖電気工業株式会社 | Spin washing method |
US4636243A (en) * | 1980-09-16 | 1987-01-13 | Eli Lilly And Company | Benzamides, compositions and agricultural method |
JPH02275631A (en) * | 1989-01-11 | 1990-11-09 | Dainippon Screen Mfg Co Ltd | Method and device for washing and treating substrate |
JPH0314230A (en) * | 1989-06-13 | 1991-01-22 | Toshiba Corp | Cleaning of semiconductor wafer and device therefor |
JP2010067819A (en) * | 2008-09-11 | 2010-03-25 | Shibaura Mechatronics Corp | Treatment device and treatment method of substrate |
US8147617B2 (en) * | 2004-06-04 | 2012-04-03 | Tokyo Electron Limited | Substrate cleaning method and computer readable storage medium |
-
1978
- 1978-03-23 JP JP3372478A patent/JPS54125981A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4636243A (en) * | 1980-09-16 | 1987-01-13 | Eli Lilly And Company | Benzamides, compositions and agricultural method |
JPS5790941A (en) * | 1980-11-27 | 1982-06-05 | Toshiba Corp | Swing type vertical washer |
JPS58122732A (en) * | 1982-01-14 | 1983-07-21 | Toshiba Corp | Wafer washing method |
JPS58200537A (en) * | 1982-05-18 | 1983-11-22 | Toshiba Corp | Applying method for resist |
JPS61131460A (en) * | 1984-11-30 | 1986-06-19 | Canon Inc | Wafer cleaning device |
JPS61178082A (en) * | 1985-02-05 | 1986-08-09 | 沖電気工業株式会社 | Spin washing method |
JPH02275631A (en) * | 1989-01-11 | 1990-11-09 | Dainippon Screen Mfg Co Ltd | Method and device for washing and treating substrate |
JPH0314230A (en) * | 1989-06-13 | 1991-01-22 | Toshiba Corp | Cleaning of semiconductor wafer and device therefor |
US8147617B2 (en) * | 2004-06-04 | 2012-04-03 | Tokyo Electron Limited | Substrate cleaning method and computer readable storage medium |
JP2010067819A (en) * | 2008-09-11 | 2010-03-25 | Shibaura Mechatronics Corp | Treatment device and treatment method of substrate |
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