JPS54124682A - Method of fabricating electron beam mask - Google Patents

Method of fabricating electron beam mask

Info

Publication number
JPS54124682A
JPS54124682A JP3112478A JP3112478A JPS54124682A JP S54124682 A JPS54124682 A JP S54124682A JP 3112478 A JP3112478 A JP 3112478A JP 3112478 A JP3112478 A JP 3112478A JP S54124682 A JPS54124682 A JP S54124682A
Authority
JP
Japan
Prior art keywords
electron beam
beam mask
fabricating electron
fabricating
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3112478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231491B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Nobuyuki Kishi
Akira Kaneki
Norihiko Tsukui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP3112478A priority Critical patent/JPS54124682A/ja
Publication of JPS54124682A publication Critical patent/JPS54124682A/ja
Publication of JPS6231491B2 publication Critical patent/JPS6231491B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
JP3112478A 1978-03-20 1978-03-20 Method of fabricating electron beam mask Granted JPS54124682A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3112478A JPS54124682A (en) 1978-03-20 1978-03-20 Method of fabricating electron beam mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3112478A JPS54124682A (en) 1978-03-20 1978-03-20 Method of fabricating electron beam mask

Publications (2)

Publication Number Publication Date
JPS54124682A true JPS54124682A (en) 1979-09-27
JPS6231491B2 JPS6231491B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-08

Family

ID=12322662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3112478A Granted JPS54124682A (en) 1978-03-20 1978-03-20 Method of fabricating electron beam mask

Country Status (1)

Country Link
JP (1) JPS54124682A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Also Published As

Publication number Publication date
JPS6231491B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-07-08

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