JPS5412390B2 - - Google Patents
Info
- Publication number
- JPS5412390B2 JPS5412390B2 JP15161776A JP15161776A JPS5412390B2 JP S5412390 B2 JPS5412390 B2 JP S5412390B2 JP 15161776 A JP15161776 A JP 15161776A JP 15161776 A JP15161776 A JP 15161776A JP S5412390 B2 JPS5412390 B2 JP S5412390B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15161776A JPS5375772A (en) | 1976-12-16 | 1976-12-16 | Forming method of positioning mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15161776A JPS5375772A (en) | 1976-12-16 | 1976-12-16 | Forming method of positioning mark |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5375772A JPS5375772A (en) | 1978-07-05 |
| JPS5412390B2 true JPS5412390B2 (ja) | 1979-05-22 |
Family
ID=15522445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15161776A Granted JPS5375772A (en) | 1976-12-16 | 1976-12-16 | Forming method of positioning mark |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5375772A (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5399770A (en) * | 1977-02-10 | 1978-08-31 | Hitachi Ltd | Soft x-ray transfer mask |
-
1976
- 1976-12-16 JP JP15161776A patent/JPS5375772A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5375772A (en) | 1978-07-05 |