JPS5411725B2 - - Google Patents
Info
- Publication number
- JPS5411725B2 JPS5411725B2 JP7028274A JP7028274A JPS5411725B2 JP S5411725 B2 JPS5411725 B2 JP S5411725B2 JP 7028274 A JP7028274 A JP 7028274A JP 7028274 A JP7028274 A JP 7028274A JP S5411725 B2 JPS5411725 B2 JP S5411725B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7028274A JPS51948A (en) | 1974-06-21 | 1974-06-21 | Hotomasukuno seizohoho |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7028274A JPS51948A (en) | 1974-06-21 | 1974-06-21 | Hotomasukuno seizohoho |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51948A JPS51948A (en) | 1976-01-07 |
| JPS5411725B2 true JPS5411725B2 (enExample) | 1979-05-17 |
Family
ID=13426966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7028274A Granted JPS51948A (en) | 1974-06-21 | 1974-06-21 | Hotomasukuno seizohoho |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51948A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5616676A (en) * | 1979-07-21 | 1981-02-17 | Hokuriku Denki Kogyo Kk | Preparation of minute pattern |
| JPH0833655B2 (ja) * | 1989-10-18 | 1996-03-29 | 三菱電機株式会社 | フォトマスク修正方法 |
| JP2539945B2 (ja) * | 1990-09-07 | 1996-10-02 | 三菱電機株式会社 | フォトマスクの製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE793605A (fr) * | 1972-01-03 | 1973-05-02 | Rca Corp | Appareil et procede pour corriger un masque photographique defectueux |
| US3814641A (en) * | 1972-07-20 | 1974-06-04 | Instr Inc | Process of fabricating silicon photomask |
-
1974
- 1974-06-21 JP JP7028274A patent/JPS51948A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51948A (en) | 1976-01-07 |