JPS541046U - - Google Patents

Info

Publication number
JPS541046U
JPS541046U JP1978063794U JP6379478U JPS541046U JP S541046 U JPS541046 U JP S541046U JP 1978063794 U JP1978063794 U JP 1978063794U JP 6379478 U JP6379478 U JP 6379478U JP S541046 U JPS541046 U JP S541046U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1978063794U
Other languages
Japanese (ja)
Other versions
JPS5524132Y2 (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS541046U publication Critical patent/JPS541046U/ja
Application granted granted Critical
Publication of JPS5524132Y2 publication Critical patent/JPS5524132Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP1978063794U 1970-11-25 1978-05-12 Expired JPS5524132Y2 (enrdf_load_html_response)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9270270A 1970-11-25 1970-11-25

Publications (2)

Publication Number Publication Date
JPS541046U true JPS541046U (enrdf_load_html_response) 1979-01-06
JPS5524132Y2 JPS5524132Y2 (enrdf_load_html_response) 1980-06-09

Family

ID=22234648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1978063794U Expired JPS5524132Y2 (enrdf_load_html_response) 1970-11-25 1978-05-12

Country Status (2)

Country Link
US (1) US3641973A (enrdf_load_html_response)
JP (1) JPS5524132Y2 (enrdf_load_html_response)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3921572A (en) * 1974-02-25 1975-11-25 Ibm Vacuum coating apparatus
US4313815A (en) * 1978-04-07 1982-02-02 Varian Associates, Inc. Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor
EP0008807A1 (de) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Vorrichtung und Verfahren zum diskontinuierlichen oder kontinuierlichen thermischen Bedampfen von Formteilen oder Bandmaterial
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
US4498832A (en) * 1982-05-21 1985-02-12 The Boc Group, Inc. Workpiece accumulating and transporting apparatus
US4478174A (en) * 1983-02-25 1984-10-23 Canadian Patents & Development Limited Vacuum coating vessel with movable shutter plate
US4518846A (en) * 1984-06-11 1985-05-21 International Business Machines Corporation Heater assembly for molecular beam epitaxy furnace
US4753417A (en) * 1985-01-28 1988-06-28 The Boc Group, Inc. Gate valve for vacuum processing apparatus
JPS61291032A (ja) * 1985-06-17 1986-12-20 Fujitsu Ltd 真空装置
JPS6235513A (ja) * 1985-08-09 1987-02-16 Hitachi Ltd 分子線エピタキシ装置
US4699555A (en) * 1986-05-08 1987-10-13 Micrion Limited Partnership Module positioning apparatus
US4747577A (en) * 1986-07-23 1988-05-31 The Boc Group, Inc. Gate valve with magnetic closure for use with vacuum equipment
US6375741B2 (en) 1991-03-06 2002-04-23 Timothy J. Reardon Semiconductor processing spray coating apparatus
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
US5464667A (en) * 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
US6245189B1 (en) 1994-12-05 2001-06-12 Nordson Corporation High Throughput plasma treatment system
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance
US6203898B1 (en) * 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
US6972071B1 (en) 1999-07-13 2005-12-06 Nordson Corporation High-speed symmetrical plasma treatment system
US6709522B1 (en) 2000-07-11 2004-03-23 Nordson Corporation Material handling system and methods for a multichamber plasma treatment system
US6841033B2 (en) * 2001-03-21 2005-01-11 Nordson Corporation Material handling system and method for a multi-workpiece plasma treatment system
SG107661A1 (en) * 2002-06-13 2004-12-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN100569996C (zh) * 2004-05-14 2009-12-16 爱德华兹真空股份有限公司 通过真空下的负荷固定腔转移物件的方法和装置
US8039052B2 (en) * 2007-09-06 2011-10-18 Intermolecular, Inc. Multi-region processing system and heads
CN101586232A (zh) * 2008-05-23 2009-11-25 鸿富锦精密工业（深圳）有限公司 补正板形变监测系统
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
KR101136728B1 (ko) * 2010-10-18 2012-04-20 주성엔지니어링(주) 기판처리장치와 그의 분해 및 조립방법
US8826857B2 (en) * 2011-11-21 2014-09-09 Lam Research Corporation Plasma processing assemblies including hinge assemblies

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3524426A (en) * 1968-02-29 1970-08-18 Libbey Owens Ford Glass Co Apparatus for coating by thermal evaporation
JPS5241117U (enrdf_load_html_response) * 1975-09-17 1977-03-24
JPS5310076A (en) * 1976-07-14 1978-01-30 Furukawa Electric Co Ltd:The Ellipsoidal coiling apparatus
JPS5317143U (enrdf_load_html_response) * 1976-07-22 1978-02-14

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2975753A (en) * 1958-11-18 1961-03-21 Nat Res Corp Vacuum coating apparatus
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
NL271345A (enrdf_load_html_response) * 1960-11-30
BE624740A (enrdf_load_html_response) * 1961-11-15
US3491720A (en) * 1965-07-29 1970-01-27 Monsanto Co Epitaxial deposition reactor
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3524426A (en) * 1968-02-29 1970-08-18 Libbey Owens Ford Glass Co Apparatus for coating by thermal evaporation
JPS5241117U (enrdf_load_html_response) * 1975-09-17 1977-03-24
JPS5310076A (en) * 1976-07-14 1978-01-30 Furukawa Electric Co Ltd:The Ellipsoidal coiling apparatus
JPS5317143U (enrdf_load_html_response) * 1976-07-22 1978-02-14

Also Published As

Publication number Publication date
JPS5524132Y2 (enrdf_load_html_response) 1980-06-09
US3641973A (en) 1972-02-15

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