JPS5410429B2 - - Google Patents
Info
- Publication number
- JPS5410429B2 JPS5410429B2 JP10990575A JP10990575A JPS5410429B2 JP S5410429 B2 JPS5410429 B2 JP S5410429B2 JP 10990575 A JP10990575 A JP 10990575A JP 10990575 A JP10990575 A JP 10990575A JP S5410429 B2 JPS5410429 B2 JP S5410429B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Packaging Frangible Articles (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/504,904 US3961877A (en) | 1974-09-11 | 1974-09-11 | Reinforced wafer basket |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5153476A JPS5153476A (en) | 1976-05-11 |
| JPS5410429B2 true JPS5410429B2 (US06262066-20010717-C00315.png) | 1979-05-07 |
Family
ID=24008195
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50109905A Granted JPS5153476A (en) | 1974-09-11 | 1975-09-10 | Hokyosaretayugamiteikoojusurueefuajoshohenyokago |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3961877A (US06262066-20010717-C00315.png) |
| JP (1) | JPS5153476A (US06262066-20010717-C00315.png) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4023691A (en) * | 1975-09-15 | 1977-05-17 | United States Fused Quartz Company, Inc. | Method of transferring semi-conductor discs by a hinged transfer carrier |
| US4129211A (en) * | 1976-09-07 | 1978-12-12 | Monsanto Company | Wafer packaging system |
| DE2702464C2 (de) * | 1977-01-21 | 1981-10-15 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verpackung von Halbleiterscheiben |
| US4197000A (en) * | 1978-05-23 | 1980-04-08 | Fsi Corporation | Positive developing method and apparatus |
| US4286541A (en) * | 1979-07-26 | 1981-09-01 | Fsi Corporation | Applying photoresist onto silicon wafers |
| US4471716A (en) * | 1981-01-15 | 1984-09-18 | Fluoroware, Inc. | Wafer carrier |
| US4450960A (en) * | 1982-08-30 | 1984-05-29 | Empak Inc. | Package |
| US4493418A (en) * | 1983-08-17 | 1985-01-15 | Empak Inc. | Wafer processing cassette |
| US4557382A (en) * | 1983-08-17 | 1985-12-10 | Empak Inc. | Disk package |
| US4588086A (en) * | 1984-06-07 | 1986-05-13 | Coe Thomas U | Substrate and media carrier |
| USRE33361E (en) * | 1984-06-07 | 1990-10-02 | Substrate and media carrier | |
| DE3440111C1 (de) * | 1984-11-02 | 1986-05-15 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Traegerhorde |
| US4687097A (en) * | 1984-12-11 | 1987-08-18 | Empak, Inc. | Wafer processing cassette |
| US4669612A (en) * | 1985-02-20 | 1987-06-02 | Empak Inc. | Disk processing cassette |
| US4724963A (en) * | 1985-02-20 | 1988-02-16 | Empak, Inc. | Wafer processing cassette |
| US4658960A (en) * | 1985-10-07 | 1987-04-21 | Iwasa Nob T | Color coding cassette |
| US4817799A (en) * | 1986-10-06 | 1989-04-04 | Empak, Inc. | Disk package |
| US4815601A (en) * | 1987-09-29 | 1989-03-28 | Fluoroware, Inc. | Carrier for flat panel displays |
| US4930634A (en) * | 1987-09-29 | 1990-06-05 | Fluoroware, Inc. | Carrier for flat panel displays |
| US4949848A (en) * | 1988-04-29 | 1990-08-21 | Fluoroware, Inc. | Wafer carrier |
| US4900395A (en) * | 1989-04-07 | 1990-02-13 | Fsi International, Inc. | HF gas etching of wafers in an acid processor |
| US5149244A (en) * | 1989-08-18 | 1992-09-22 | Applied Materials, Inc. | Apparatus for aligning wafers within a semiconductor wafer cassette |
| US5217341A (en) * | 1989-08-18 | 1993-06-08 | Applied Materials, Inc. | Method for aligning wafers within a semiconductor wafer cassette |
| US5111936A (en) * | 1990-11-30 | 1992-05-12 | Fluoroware | Wafer carrier |
| US5110001A (en) * | 1991-03-04 | 1992-05-05 | Micron Technology, Inc. | Handle for wafer carrier |
| US5123681A (en) * | 1991-03-20 | 1992-06-23 | Fluoroware, Inc. | Latch for wafer storage box for manual or robot operation |
| EP0520393B1 (en) * | 1991-06-25 | 1996-11-27 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Photographic element containing stress absorbing protective layer |
| US5749469A (en) * | 1992-05-15 | 1998-05-12 | Fluoroware, Inc. | Wafer carrier |
| US5472086A (en) * | 1994-03-11 | 1995-12-05 | Holliday; James E. | Enclosed sealable purgible semiconductor wafer holder |
| US5476176A (en) * | 1994-05-23 | 1995-12-19 | Empak, Inc. | Reinforced semiconductor wafer holder |
| DE69828466T2 (de) * | 1997-01-21 | 2005-12-15 | The Yokohama Rubber Co., Ltd. | Bei raumtemperatur unter feuchtigkeit härtbare einkomponentige harzzusammensetzungen |
| US6520191B1 (en) | 1998-10-19 | 2003-02-18 | Memc Electronic Materials, Inc. | Carrier for cleaning silicon wafers |
| US6758339B2 (en) * | 2001-07-12 | 2004-07-06 | Entegris, Inc. | Thin wafer carrier |
| TW522448B (en) * | 2001-10-22 | 2003-03-01 | Advanced Semiconductor Eng | Semiconductor wafer carrying apparatus |
| US7175026B2 (en) * | 2002-05-03 | 2007-02-13 | Maxtor Corporation | Memory disk shipping container with improved contaminant control |
| KR100655431B1 (ko) * | 2005-03-23 | 2006-12-11 | 삼성전자주식회사 | 웨이퍼와의 접촉 면적을 최소화할 수 있는 웨이퍼 캐리어 및 이를 이용한 웨이퍼 세정방법 |
| JP4999808B2 (ja) * | 2008-09-29 | 2012-08-15 | 東京エレクトロン株式会社 | 基板処理装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS478166U (US06262066-20010717-C00315.png) * | 1971-02-18 | 1972-09-29 | ||
| JPS4952599A (US06262066-20010717-C00315.png) * | 1972-09-20 | 1974-05-22 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1885691A (en) * | 1928-04-24 | 1932-11-01 | New Castle Refractories Compan | Ware support |
| CH471013A (de) * | 1967-03-15 | 1969-04-15 | Ebauches Sa | Halter für mit Flansch versehene Packungen |
| US3486631A (en) * | 1967-09-29 | 1969-12-30 | John T Shaler Co | Basket for polished wafers |
| US3473670A (en) * | 1968-01-30 | 1969-10-21 | Fluoroware Inc | Article supporting basket |
| US3467242A (en) * | 1968-03-04 | 1969-09-16 | Dale E De Rousse | Storage unit for wafer-like articles |
| US3534862A (en) * | 1968-09-13 | 1970-10-20 | Rca Corp | Semiconductor wafer transporting jig |
| DE2133843A1 (de) * | 1971-07-07 | 1973-01-18 | Siemens Ag | Anordnung zum eindiffundieren von dotierstoffen in halbleiterscheiben |
| US3701558A (en) * | 1971-07-19 | 1972-10-31 | Fluoroware Inc | Detachable handle for receptacle |
| US3850296A (en) * | 1971-07-21 | 1974-11-26 | Shinetsu Handotai Kk | Device and method for accommodating semiconductor wafers |
| US3737282A (en) * | 1971-10-01 | 1973-06-05 | Ibm | Method for reducing crystallographic defects in semiconductor structures |
| US3819076A (en) * | 1971-10-20 | 1974-06-25 | C Oehler | Special pallet type load transport apparatus |
-
1974
- 1974-09-11 US US05/504,904 patent/US3961877A/en not_active Expired - Lifetime
-
1975
- 1975-09-10 JP JP50109905A patent/JPS5153476A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS478166U (US06262066-20010717-C00315.png) * | 1971-02-18 | 1972-09-29 | ||
| JPS4952599A (US06262066-20010717-C00315.png) * | 1972-09-20 | 1974-05-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5153476A (en) | 1976-05-11 |
| US3961877B1 (US06262066-20010717-C00315.png) | 1987-11-03 |
| US3961877A (en) | 1976-06-08 |
