JPS536666B2 - - Google Patents
Info
- Publication number
- JPS536666B2 JPS536666B2 JP5906573A JP5906573A JPS536666B2 JP S536666 B2 JPS536666 B2 JP S536666B2 JP 5906573 A JP5906573 A JP 5906573A JP 5906573 A JP5906573 A JP 5906573A JP S536666 B2 JPS536666 B2 JP S536666B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Adhesives Or Adhesive Processes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5906573A JPS536666B2 (en) | 1973-05-25 | 1973-05-25 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5906573A JPS536666B2 (en) | 1973-05-25 | 1973-05-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS508832A JPS508832A (en) | 1975-01-29 |
JPS536666B2 true JPS536666B2 (en) | 1978-03-10 |
Family
ID=13102557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5906573A Expired JPS536666B2 (en) | 1973-05-25 | 1973-05-25 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS536666B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS603295B2 (en) * | 1977-05-30 | 1985-01-26 | 東亞合成株式会社 | Method for producing low skin irritation oligomer |
DE3880427T2 (en) * | 1987-10-22 | 1993-09-23 | Nichiban Kk | REACTIVE ADHESIVE ADHESIVE |
JP2782909B2 (en) * | 1990-04-05 | 1998-08-06 | 日本油脂株式会社 | Photopolymerizable resin composition |
-
1973
- 1973-05-25 JP JP5906573A patent/JPS536666B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS508832A (en) | 1975-01-29 |