JPS536283A - Liquid divider - Google Patents

Liquid divider

Info

Publication number
JPS536283A
JPS536283A JP8062176A JP8062176A JPS536283A JP S536283 A JPS536283 A JP S536283A JP 8062176 A JP8062176 A JP 8062176A JP 8062176 A JP8062176 A JP 8062176A JP S536283 A JPS536283 A JP S536283A
Authority
JP
Japan
Prior art keywords
liquid divider
liquid
ascend
forcing
contamination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8062176A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5520079B2 (enrdf_load_stackoverflow
Inventor
Shigetake Okamoto
Akihiko Umezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP8062176A priority Critical patent/JPS536283A/ja
Publication of JPS536283A publication Critical patent/JPS536283A/ja
Publication of JPS5520079B2 publication Critical patent/JPS5520079B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
JP8062176A 1976-07-07 1976-07-07 Liquid divider Granted JPS536283A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8062176A JPS536283A (en) 1976-07-07 1976-07-07 Liquid divider

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8062176A JPS536283A (en) 1976-07-07 1976-07-07 Liquid divider

Publications (2)

Publication Number Publication Date
JPS536283A true JPS536283A (en) 1978-01-20
JPS5520079B2 JPS5520079B2 (enrdf_load_stackoverflow) 1980-05-30

Family

ID=13723409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8062176A Granted JPS536283A (en) 1976-07-07 1976-07-07 Liquid divider

Country Status (1)

Country Link
JP (1) JPS536283A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59150929A (ja) * 1982-11-01 1984-08-29 Chushiro Shindo 内燃機関

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59150929A (ja) * 1982-11-01 1984-08-29 Chushiro Shindo 内燃機関

Also Published As

Publication number Publication date
JPS5520079B2 (enrdf_load_stackoverflow) 1980-05-30

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