JPS535575A - Method of developing photoresist - Google Patents

Method of developing photoresist

Info

Publication number
JPS535575A
JPS535575A JP8021276A JP8021276A JPS535575A JP S535575 A JPS535575 A JP S535575A JP 8021276 A JP8021276 A JP 8021276A JP 8021276 A JP8021276 A JP 8021276A JP S535575 A JPS535575 A JP S535575A
Authority
JP
Japan
Prior art keywords
developing photoresist
photoresist
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8021276A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5532214B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Teramoto
Katsumi Nakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akai Electric Co Ltd
Original Assignee
Akai Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akai Electric Co Ltd filed Critical Akai Electric Co Ltd
Priority to JP8021276A priority Critical patent/JPS535575A/ja
Publication of JPS535575A publication Critical patent/JPS535575A/ja
Publication of JPS5532214B2 publication Critical patent/JPS5532214B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8021276A 1976-07-05 1976-07-05 Method of developing photoresist Granted JPS535575A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8021276A JPS535575A (en) 1976-07-05 1976-07-05 Method of developing photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8021276A JPS535575A (en) 1976-07-05 1976-07-05 Method of developing photoresist

Publications (2)

Publication Number Publication Date
JPS535575A true JPS535575A (en) 1978-01-19
JPS5532214B2 JPS5532214B2 (enrdf_load_stackoverflow) 1980-08-23

Family

ID=13712069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8021276A Granted JPS535575A (en) 1976-07-05 1976-07-05 Method of developing photoresist

Country Status (1)

Country Link
JP (1) JPS535575A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01181525A (ja) * 1988-01-11 1989-07-19 Toppan Printing Co Ltd スプレー装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01181525A (ja) * 1988-01-11 1989-07-19 Toppan Printing Co Ltd スプレー装置

Also Published As

Publication number Publication date
JPS5532214B2 (enrdf_load_stackoverflow) 1980-08-23

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